AMAT 0010-02657冷却室组件

AMAT 0010-02657冷却室组件

1.产 品 资 料 介 绍：

AMAT 0010-02657 冷却室组件

产品概述

AMAT（Applied Materials）0010-02657 冷却室组件是半导体制造设备中用于热管理与温控的核心模块。它主要通过液体或气体循环系统，将设备关键部件（如反应腔体、加热器、电源模块、控制箱等）产生的热量有效带走，维持设备运行温度在工艺允许范围内，确保工艺精度和设备稳定性。冷却室组件在沉积、刻蚀和离子注入等高功率工艺中尤为重要。

技术参数（典型方向，具体数据需参考原厂资料）

• 冷却方式：液体循环或气冷（视具体设备而定）

• 适用功率范围：高功率工艺模块的热量散热

• 温度控制：支持精确温控，保证工艺温度稳定

• 接口：流体进出口接口、温度传感器接口

• 材料与环境适应性：耐腐蚀、耐高温材料，适应洁净室环境

• 模块化设计：便于安装、维护和更换

应用场景

1. 沉积工艺（CVD/PVD/ALD）

   • 冷却反应腔体和加热器模块，保持腔体温度均匀，确保薄膜沉积一致性

   • 避免过热导致薄膜缺陷或设备损坏

2. 刻蚀工艺设备

   • 冷却射频功率模块、电源模块和腔体，保证刻蚀精度和等离子体稳定性

3. 离子注入系统

   • 控制离子源和扫描系统温度，保持剂量和能量一致性

   • 避免温升影响器件加工精度

4. 控制箱与底盘控制箱

   • 冷却电子模块和电源模块，延长模块寿命，提高系统可靠性

5. 研发与实验室平台

   • 提供稳定温控环境，支持工艺开发和实验验证

AMAT  0010-02657冷却室组件 英文资料：

AMAT 0010-02657 Cooling Chamber Component

Product Overview

AMAT (Applied Materials) 0010-02657 cooling chamber component is a core module used for thermal management and temperature control in semiconductor manufacturing equipment. It mainly uses liquid or gas circulation systems to effectively remove the heat generated by key components of the equipment (such as reaction chambers, heaters, power modules, control boxes, etc.), maintain the operating temperature of the equipment within the allowable range of the process, and ensure process accuracy and equipment stability. Cooling chamber components are particularly important in high-power processes such as deposition, etching, and ion implantation.

Technical parameters (typical direction, specific data should refer to the original factory information)

Cooling method: liquid circulation or air cooling (depending on the specific equipment)

Applicable power range: Heat dissipation for high-power process modules

Temperature control: supports precise temperature control to ensure stable process temperature

Interface: Fluid inlet and outlet interface, temperature sensor interface

Material and environmental adaptability: corrosion-resistant and high-temperature resistant materials, suitable for clean room environments

Modular design: easy to install, maintain, and ｒｅｐｌａｃｅ

Application scenarios

Deposition process (CVD/PVD/ALD)

Cool the reaction chamber and heater module to maintain uniform chamber temperature and ensure consistent film deposition

Avoid film defects or equipment damage caused by overheating

Etching process equipment

Cooling RF power module, power module, and cavity to ensure etching accuracy and plasma stability

Ion implantation system

Control the temperature of the ion source and scanning system to maintain consistency in dose and energy

Avoid temperature rise affecting device processing accuracy

Control box and chassis control box

Cooling electronic modules and power modules, extending module lifespan, and improving system reliability

R&D and laboratory platform

Provide a stable temperature control environment, support process development and experimental verification

AMAT 0010-02657冷却室组件 产品展示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218