AMAT 0010-09301节流阀组件

AMAT  0010-09301节流阀组件

1.产 品 资 料 介 绍：

AMAT 0010-09301 节流阀组件

产品概述

AMAT（Applied Materials）0010-09301 节流阀组件是一种用于半导体制造设备的气体或液体流量控制模块。通过调节阀门开度，实现对流体流量或压力的精确控制，确保设备内部工艺参数（如腔体压力、气体流量或液体冷却流量）保持稳定。该组件广泛应用于沉积、刻蚀及气动系统中，是实现工艺精度和设备安全的重要执行单元。

技术参数（典型方向，具体数据需参考原厂资料）

• 控制方式：手动或自动驱动，可通过气动/电子信号调节

• 适用介质：工艺气体、冷却液或惰性气体

• 流量范围：根据工艺需求设计，可实现微调控制

• 压力范围：适应设备工艺腔体或管路的工作压力

• 接口：兼容 AMAT 系统管路及控制接口

• 环境适应性：洁净室兼容，耐腐蚀和高温

• 安装方式：模块化安装，便于集成和维护

应用场景

1. 沉积工艺（CVD/PVD/ALD）

   • 精确控制反应腔体气体流量或压力

   • 保证薄膜沉积均匀性和工艺重复性

2. 刻蚀工艺设备

   • 调节刻蚀腔体的气体流量或压力，维持刻蚀精度

   • 与射频功率模块和传感器协同工作

3. 冷却与气动系统

   • 控制冷却液或辅助气体流量

   • 保护电子模块或腔体组件，防止过压或过流

4. 设备维护与调试

   • 提供可调节的阀门控制，便于工艺参数调试和设备维护

AMAT  0010-09301节流阀组件 英文资料：

AMAT 0010-09301 Throttle Valve Component

Product Overview

AMAT (Applied Materials) 0010-09301 throttle valve assembly is a gas or liquid flow control module used in semiconductor manufacturing equipment. By adjusting the valve opening, precise control of fluid flow or pressure can be achieved to ensure stable internal process parameters of the equipment, such as chamber pressure, gas flow rate, or liquid cooling flow rate. This component is widely used in deposition, etching, and pneumatic systems, and is an important execution unit for achieving process accuracy and equipment safety.

Technical parameters (typical direction, specific data should refer to the original factory information)

Control mode: manual or automatic drive, adjustable through pneumatic/electronic signals

Applicable medium: process gas, coolant or inert gas

Flow range: Designed according to process requirements, can achieve fine tuning control

Pressure range: Suitable for the working pressure of equipment process chambers or pipelines

Interface: Compatible with AMAT system pipelines and control interfaces

Environmental adaptability: cleanroom compatibility, corrosion resistance, and high temperature resistance

Installation method: Modular installation, easy to integrate and maintain

Application scenarios

Deposition process (CVD/PVD/ALD)

Accurately control the gas flow rate or pressure in the reaction chamber

Ensure the uniformity of thin film deposition and process repeatability

Etching process equipment

Adjust the gas flow rate or pressure in the etching chamber to maintain etching accuracy

Collaborate with RF power modules and sensors

Cooling and Pneumatic System

Control the flow of coolant or auxiliary gas

Protect electronic modules or cavity components from overvoltage or overcurrent

Equipment maintenance and debugging

Provide adjustable valve control for easy process parameter tuning and equipment maintenance

AMAT 0010-09301节流阀组件 产品展示      

 产品视频

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218