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AMAT Applied Materials 0010-42744射频匹配器

发布时间:2025-09-24人气:
  • AMAT Applied Materials 0010-42744射频匹配器
  • AMAT Applied Materials 0010-42744射频匹配器
  • AMAT Applied Materials 0010-42744射频匹配器

AMAT Applied Materials 0010-42744射频匹配器

1.产 品 资 料 介 绍:

AMAT Applied Materials 0010-42744 是一款自动射频匹配器,用于在半导体制造设备中将射频电源与负载(如反应腔、等离子体源)的阻抗动态匹配,实现 13.56MHz 频段的高效功率传输并降低反射功率。

核心功能

  • 自动调谐:内置伺服电机驱动可变电容和电感,实时跟踪负载阻抗变化
  • 反射功率抑制:通过定向耦合器和相位 / 幅度检测,闭环调节使反射功率最小化
  • 功率范围:典型支持 0–1000W 射频功率,适配多种工艺设备
  • 频率特性:固定工作于 13.56MHz(工业标准等离子体激发频率)
  • 通信接口:提供 RS-485、Ethernet 或专用总线,支持与上位机 / 控制器集成

技术特点

项目参数 / 特性
频率13.56MHz(固定)
功率容量0–1000W(典型值)
匹配范围5–500Ω(可调)
调谐时间典型 <100ms(全范围)
接口形式N 型或 SMA 射频接口
保护功能过功率、过反射、过热保护
机械规格标准 19" 机架或机箱内安装

典型应用

  • 刻蚀设备:射频耦合腔、极板匹配
  • PECVD 沉积设备:反应腔阻抗匹配
  • 溅射设备:靶材射频功率高效传输
  • 离子注入机:射频源与匹配网络优化

AMAT Applied Materials 0010-42744射频匹配器 英文资料:

AMAT Applied Materials 0010-42744 is an automatic RF matching device used to dynamically match the impedance of RF power sources and loads (such as reaction chambers and plasma sources) in semiconductor manufacturing equipment, achieving efficient power transmission in the 13.56MHz frequency band and reducing reflected power.

core functionality

Automatic tuning: Built in servo motor drives variable capacitors and inductors, real-time tracking of load impedance changes

Reflection power suppression: By using directional couplers and phase/amplitude detection, closed-loop adjustment minimizes the reflection power

Power range: Typical support for 0-1000W RF power, compatible with various process equipment

Frequency characteristics: Fixed operating at 13.56MHz (industrial standard plasma excitation frequency)

Communication interface: Provides RS-485, Ethernet or dedicated bus, supports integration with upper computer/controller

Technical Features

Project parameters/characteristics

Frequency 13.56MHz (fixed)

Power capacity 0-1000W (typical value)

Matching range 5-500 Ω (adjustable)

Typical tuning time<100ms (full range)

Interface form: N-type or SMA RF interface

Protection functions include over power, over reflection, and over heat protection

Mechanical specification standard 19 "rack or chassis installation

Typical Applications

Etching equipment: RF coupling cavity, electrode matching

PECVD deposition equipment: impedance matching of reaction chamber

Sputtering equipment: efficient transmission of target RF power

Ion implantation machine: RF source and matching network optimization

AMAT Applied Materials  0010-42744射频匹配器 产品展示      

applied_materials_0010-42744_high_eff_-bias_vectra_imp_pvd_rf_match_pls_read_1.jpg

 产品视频

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218

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