AMAT Applied Materials 0100-01652气体面板

AMAT Applied Materials  0100-01652气体面板

1.产 品 资 料 介 绍：

核心规格

功能特点

• 高精度控制：每路独立 MFC，确保流量稳定，可实现 ppm 级控制。
• 耐腐蚀设计：适用于含氟、含氯等强腐蚀性气体。
• 模块化结构：通道可扩展或更换，维护便捷。
• 状态监测：配备压力、流量、温度传感器及 LED 指示灯，实时反馈运行状态。
• 安全防护：具备过压、欠压、泄漏检测及自动切断功能，符合 SEMI S2 安全标准。

典型应用

• 高密度等离子体化学气相沉积（HDPCVD）
• 氮化硅、氧化硅、多晶硅薄膜沉积
• 刻蚀、清洗工艺气体供应
• 300 mm 晶圆制造中的气体分配与流量控制

AMAT Applied Materials 0100-01652气体面板 英文资料：

AMAT Applied Materials 0100-01652 gas panel is an HDPCVD 300 mm platform gas distribution component, model Rev. 001, used for precise control and distribution of process gases to the reaction chamber, ensuring flow rate, pressure stability, and process repeatability.

Core specifications

Project specification remarks

Application series HDPCVD 300 mm high-density plasma chemical vapor deposition

Version number Rev. 001 Hardware iteration mark

Functional gas distribution and flow control with multiple independent channels

Number of channels 8-12 (customizable) Typical configuration 10 channels

Input gas types such as N ₂, O ₂, H ₂, Ar, NF ∝, SiH ₄, etc. to support corrosive and reactive gases

Input pressure ≤ 200 PSI (1.4 MPa) Process pressure range

Flow control quality flow controller (MFC) accuracy ± 1% F.S

Interface type VCR, Swagelok, CF flange high vacuum/high-purity connection

Material: 316L stainless steel, Hastelloy, PTFE, corrosion-resistant, low adsorption

Installation of standard cabinet with dimensions of approximately 600 × 400 × 200 mm

Protection level IP20 dustproof and splash proof

Features

High precision control: Each independent MFC ensures stable flow and can achieve ppm level control.

Corrosion resistant design: suitable for highly corrosive gases such as fluorine and chlorine.

Modular structure: Channels can be expanded or replaced, making maintenance convenient.

Status monitoring: equipped with pressure, flow, temperature sensors and LED indicator lights, providing real-time feedback on operating status.

Safety protection: equipped with overvoltage, undervoltage, leakage detection and automatic cut-off functions, in compliance with SEMI S2 safety standards.

Typical Applications

High density plasma chemical vapor deposition (HDPCVD)

Deposition of Silicon Nitride, Silicon Oxide, and Polycrystalline Silicon Thin Films

Gas supply for etching and cleaning processes

Gas Distribution and Flow Control in 300mm Wafer Manufacturing

AMAT Applied Materials  0100-01652气体面板 产品展示      

 产品视频

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218