AMAT Applied Materials 0190-26327热离子加热器

AMAT Applied Materials 0190-26327热离子加热器

1.产 品 资 料 介 绍：

核心规格

功能特点

• 高效加热：热离子发射结合离子辅助，升温快、热效率高。
• 均匀性佳：温度分布均匀，适用于精密薄膜工艺。
• 稳定性强：耐高温、耐腐蚀，使用寿命长。
• 安全设计：过热保护、接地保护，符合 SEMI S2 安全标准。
• 可定制化：可按设备要求调整功率、尺寸及接口。

典型应用

• 300 mm 晶圆 PVD 靶材加热
• CVD 反应腔室晶圆基座加热
• 离子注入靶室加热

AMAT Applied Materials 0190-26327热离子加热器 英文资料：

AMAT Applied Materials 0190-26327 is a high-power thermal ion heater used for semiconductor thin film deposition (PVD, CVD), etching, and 300 mm wafer platforms. It heats the target or wafer base through thermal electron emission to achieve uniform heating at 100-800 ℃, ensuring process stability and repeatability.

Core specifications

Project specification remarks

Application series: 300 mm wafer platform compatible with PVD/CVD/EPI and other systems

Heating principle: Thermal ion emission heating tungsten/molybdenum wire heating+ion bombardment assistance

Heating power 3-6 kW (adjustable), typical 4.5 kW

Working temperature: 100-800 ℃, uniformity: ± 1.5 ℃

Temperature control accuracy ± 0.5 ℃ PID closed-loop control

Material: High temperature resistant tungsten/molybdenum heating element+high-purity quartz/ceramic insulation, corrosion-resistant and high-temperature resistant

Installation method: flange/bolt fixation for easy maintenance

Protection level IP20 dustproof and splash proof

Power supply 200-240 VAC, 50/60 Hz, single/three-phase optional

Cooling method: air cooling/water cooling depending on power selection

Features

Efficient heating: Combining thermal ion emission with ion assistance, it heats up quickly and has high thermal efficiency.

Good uniformity: uniform temperature distribution, suitable for precision thin film processes.

Strong stability: high temperature resistance, corrosion resistance, long service life.

Safety design: overheating protection, grounding protection, in compliance with SEMI S2 safety standards.

Customizable: Power, size, and interface can be adjusted according to device requirements.

Typical Applications

Heating of 300 mm wafer PVD target material

CVD reaction chamber wafer base heating

Ion implantation target chamber heating

AMAT Applied Materials  0190-26327热离子加热器 产品展示      

 产品视频

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218