AMAT Applied Materials ESC-W2电源控制器

AMAT Applied Materials ESC-W2电源控制器

1.产 品 资 料 介 绍：

核心规格

性能特点

• 高精度温控：结合 ESC 内置热电偶 / 铂电阻，温度控制精度可达 ±0.1℃，确保晶圆工艺一致性。
• 多模式输出：支持直流恒压 / 恒流、脉冲电压、脉冲电流模式，适配不同材料与工艺。
• 安全设计：具备主动弧光检测与抑制功能，防止放电损伤设备与晶圆。
• 易维护性：模块化结构，热插拔设计，支持在线更换，降低停机时间。
• 远程监控：可通过 SECS/GEM 协议与工厂 MES 系统对接，实现参数实时监控与故障预警。

典型应用

• 刻蚀（Etch）与化学气相沉积（CVD）工艺中的 ESC 供电与温控
• 物理气相沉积（PVD）与原子层沉积（ALD）设备的静电吸附控制
• 离子注入（Ion Implant）系统的晶圆夹具供电

AMAT Applied Materials  ESC-W2电源控制器  英文资料：

AMAT Applied Materials ESC-W2 is a high-performance power controller for semiconductor manufacturing equipment, mainly used for precision power supply and temperature control of electrostatic chucks (ESC), compatible with platforms such as Centura, Endura, P5000, etc.

Core specifications

Project specification remarks

Adapt to multi chamber wafer manufacturing systems such as Centura, Endura, P5000, Producer, etc

Input voltage three-phase AC 380V ± 10%, 50/60   Hz power supply

Output voltage 0-200V DC adjustable according to wafer process requirements

Maximum output current 50   A (peak value 80   A, ≤ 10   s) Short time high current support

Control method: Digital PID closed-loop control, high-precision temperature and voltage synchronous regulation

Communication interfaces RS-485/RS-232, EtherNet/IP, SEMI SECS/GEM support remote monitoring

Working temperature: 0 ℃~50 ℃, naturally air-cooled or forced air-cooled

Standard 19 "3U chassis for easy shelving

Protection function: overcurrent, overvoltage, undervoltage, overheating, short circuit, arc detection, quick cut-off protection

Performance Characteristics

High precision temperature control: Combined with ESC built-in thermocouple/platinum resistor, the temperature control accuracy can reach ± 0.1 ℃, ensuring wafer process consistency.

Multi mode output: Supports DC constant voltage/constant current, pulse voltage, and pulse current modes, suitable for different materials and processes.

Safety design: Equipped with active arc detection and suppression functions to prevent discharge damage to equipment and wafers.

Maintainability: Modular structure, hot swappable design, support for online replacement, reducing downtime.

Remote monitoring: It can be integrated with the factory MES system through SECS/GEM protocol to achieve real-time parameter monitoring and fault warning.

Typical Applications

ESC power supply and temperature control in Etch and CVD processes

Electrostatic Adsorption Control of Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) Equipment

Power supply for wafer fixtures in ion implantation systems

AMAT Applied Materials  ESC-W2电源控制器 产品展示      

 产品视频

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218