AMAT 0041-61152控制器

AMAT  0041-61152控制器

1.产 品 资 料 介 绍：

AMAT 0041-61152 控制器

产品概述

AMAT（Applied Materials）0041-61152 控制器是应用于半导体制造设备的核心电子控制单元之一，主要用于设备运行参数的实时监控、逻辑运算和工艺执行控制。它相当于设备的“大脑”，通过信号采集与反馈，协调气体系统、真空系统、加热单元及其他关键子模块的运行，从而保障工艺的稳定性与安全性。

技术参数（典型方向，具体数据需参考原厂资料）

• 处理核心：工业级嵌入式处理器，支持实时运算与多任务控制

• 接口：多路数字/模拟 I/O，支持高速数据采集和信号输出

• 通信能力：兼容多种总线/协议，可与主控系统或其他模块交互

• 安全功能：内置故障诊断、互锁逻辑和报警机制

• 适配平台：可用于 AMAT 的沉积、刻蚀、离子注入等多种设备

应用场景

1. 沉积设备（CVD/PVD/ALD）

   • 管理反应腔体的温度、气体流量、等离子体功率等关键工艺参数。

   • 确保薄膜沉积的均匀性和稳定性。

2. 刻蚀工艺设备

   • 实时监控气体比例、真空度、射频功率，动态调整刻蚀速率。

   • 提供轮廓控制和工艺窗口优化。

3. 离子注入设备

   • 控制离子源参数（能量、剂量、束流均匀性），提升器件电性一致性。

4. 气体与真空控制系统

   • 协调阀门、流量控制器、真空泵运行，保持腔体环境稳定。

5. 安全与联锁管理

   • 当检测到气体泄漏、过压、过温等异常时，立即触发互锁保护。

   • 保障设备与人员的安全。

6. 研发与实验室工艺

   • 在工艺开发和测试平台中，用于多变量实验的参数控制和数据记录。

AMAT 0041-61152控制器 英文资料：

AMAT 0041-61152 Controller

Product Overview

The AMAT (Applied Materials) 0041-61152 controller is one of the core electronic control units used in semiconductor manufacturing equipment, mainly for real-time monitoring of equipment operating parameters, logical operations, and process execution control. It is equivalent to the "brain" of the device, coordinating the operation of gas systems, vacuum systems, heating units, and other key sub modules through signal acquisition and feedback, thereby ensuring the stability and safety of the process.

Technical parameters (typical direction, specific data should refer to the original factory information)

Processing core: Industrial grade embedded processor, supporting real-time computation and multitasking control

Interface: Multi channel digital/analog I/O, supporting high-speed data acquisition and signal output

Communication capability: Compatible with multiple buses/protocols, able to interact with the main control system or other modules

Safety features: Built in fault diagnosis, interlock logic, and alarm mechanism

Adaptation platform: can be used for various equipment such as AMAT deposition, etching, ion implantation, etc

Application scenarios

Sedimentation equipment (CVD/PVD/ALD)

Manage key process parameters such as temperature, gas flow rate, and plasma power in the reaction chamber.

Ensure the uniformity and stability of thin film deposition.

Etching process equipment

Real time monitoring of gas ratio, vacuum degree, RF power, and dynamic adjustment of etching rate.

Provide contour control and process window optimization.

Ion implantation equipment

Control ion source parameters (energy, dose, beam uniformity) to improve device electrical consistency.

Gas and vacuum control system

Coordinate the operation of valves, flow controllers, and vacuum pumps to maintain a stable chamber environment.

Safety and Interlocking Management

When abnormal conditions such as gas leakage, overpressure, and overheating are detected, interlock protection is immediately triggered.

Ensure the safety of equipment and personnel.

R&D and laboratory processes

Parameter control and data recording for multivariate experiments in process development and testing platforms.

AMAT 0041-61152控制器 产品展示      

 产品视频

3.其他产品

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IS220PDOAH1A 处理器模块

4.其他英文产品

NF93A-2 HESG440280R2 module
SST-PFB-SLC Communication module
BENTLY 125760-01 vibration monitor

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218