Advanced Energy 3153137-934远程等离子体源

Advanced Energy 3153137-934远程等离子体源 

1.产 品 资 料 介 绍：

Advanced Energy 3153137-934 远程等离子体源

开头：Advanced Energy 3153137-934 是半导体刻蚀、腔体清洗专用远程等离子体源，可高效激发工艺气体生成等离子体，保障晶圆制程稳定，核心特点如下：

射频能量输出均匀，等离子体生成持续稳定，无瞬时功率波动

远程激发设计，等离子体远离晶圆，避免基片离子损伤

内置阻抗自动匹配回路，快速适配不同工艺气体工况

多重安全防护，过温、过驻波、过功率自动联锁停机

适配氟基、氧基多种清洗气体，腔体除副产物效率高

一体式水冷散热结构，长时间满载运行温升可控

搭载数字通讯接口，可远程调控功率、气体配比参数

腔体耐腐蚀特种合金材质，耐腐蚀性工艺气体冲刷

低谐波射频输出，降低车间周边设备电磁干扰影响

内置多组工艺配方存储，切换清洗程序无需重复调试

实时状态自检，故障代码快速定位气源、电路异常

标准法兰安装接口，可直接对接半导体工艺腔体管路

软启动功率输出，减少瞬间高压对内部元件冲击损耗

整机密封防尘构造，符合无尘半导体车间使用标准

原厂适配各类薄膜沉积、干法清洗半导体量产设备

结尾：Advanced Energy 3153137-934 等离子激发效率高、使用寿命长，是半导体腔体清洗工艺核心配套设备。

Advanced Energy 3153137-934远程等离子体源  产品英文

Advanced Energy 3153137-934 Remote Plasma Source

Introduction: Advanced Energy 3153137-934 is a remote plasma source specifically designed for semiconductor etching and cavity cleaning. It can efficiently excite process gases to generate plasma, ensuring stable wafer processes. Its core features are as follows:

Uniform RF energy output, continuous and stable plasma generation, no instantaneous power fluctuations

Remote excitation design, keeping plasma away from the wafer to avoid substrate ion damage

Built in impedance automatic matching circuit, quickly adapting to different process gas working conditions

Multiple safety protections, automatic interlocking shutdown for over temperature, over standing wave, and over power

Suitable for various cleaning gases such as fluorine and oxygen, with high efficiency in removing by-products from the chamber

Integrated water-cooled heat dissipation structure, controllable temperature rise during long-term full load operation

Equipped with a digital communication interface, it can remotely control power and gas ratio parameters

The cavity is made of corrosion-resistant special alloy material, which is resistant to process gas erosion

Low harmonic RF output to reduce electromagnetic interference from surrounding equipment in the workshop

Built in multiple sets of process formula storage, no need for repeated debugging when switching cleaning programs

Real time status self check, quick identification of fault codes for abnormal gas sources and circuits

Standard flange installation interface, can directly connect to semiconductor process chamber pipelines

Soft start power output, reducing instantaneous high voltage impact loss on internal components

The whole machine is sealed and dust-proof, meeting the standards for use in dust-free semiconductor workshops

Original factory compatible with various thin film deposition and dry cleaning semiconductor production equipment

Conclusion: Advanced Energy 3153137-934 has high plasma excitation efficiency and long service life, and is a core supporting equipment for semiconductor cavity cleaning process.

Advanced Energy 3153137-934远程等离子体源  产品展示

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英文产品

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218