1.产 品 资 料 介 绍：
LAM 853-143791-912 光谱仪
- 高分辨率分光检测，精准捕捉等离子特征光谱
- 实时采集光强数据，自动判定刻蚀终点停止工艺
- 内置高精度探测器，微弱光谱信号识别稳定
- 光学光路密封防尘，适配半导体无尘腔体环境
- 抗射频干扰光学隔离设计，不受腔体射频影响
- 快速光谱采样，工艺波动实时反馈主控系统
- 集成自检程序，开机自动校验光路与信号
- 金属紧凑模组，机台原位安装不占用额外空间
- 标准通讯接口，对接设备上位机上传工艺曲线
- 耐温光学元件，腔体长期高温工况性能不衰减
- 多重信号故障报警，快速定位光路、线路异常
- 原厂匹配 LAM 系列 ICP 刻蚀设备，直装替换
- 低损耗石英光路，光谱透过率高检测误差小
- 加固内部线路，耐受设备持续震动不偏移
- 出厂等离子联动校准，检测一致性可靠结尾：LAM 853-143791-912 检测精准稳定，精准把控刻蚀终点，有效提升晶圆工艺良率。
LAM 853-143791-912光谱仪 产品英文
LAM 853-143791-912 Spectrometer
Introduction: LAM 853-143791-912 is a plasma spectral detection module equipped with the Panlin etching machine, which monitors the plasma state inside the cavity in real time and controls the endpoint of the etching process.
High resolution spectroscopic detection, accurately capturing plasma characteristic spectra
Real time collection of light intensity data, automatic determination of etching endpoint stop process
Built in high-precision detector, stable recognition of weak spectral signals
Optical path sealed and dust-proof, suitable for semiconductor dust-free chamber environment
Anti RF interference optical isolation design, not affected by cavity RF
Fast spectral sampling, real-time feedback control system for process fluctuations
Integrated self-test program, automatically verifies optical path and signal upon startup
Compact metal module, installed in situ on the machine without occupying additional space
Standard communication interface, connect to the upper computer of the device to upload process curves
Temperature resistant optical components, the long-term high-temperature performance of the cavity does not deteriorate
Multiple signal fault alarm, quickly locate optical and line abnormalities
Original factory matching LAM series ICP etching equipment, direct installation replacement
Low loss quartz optical path, high spectral transmittance, small detection error
Reinforce internal wiring to withstand continuous vibration of equipment without displacement
Factory plasma linkage calibration ensures reliable consistency in testing
Conclusion: LAM 853-143791-912 has precise and stable detection, accurately controls the etching endpoint, and effectively improves wafer process yield.
LAM 853-143791-912光谱仪 产品展示
视频展示
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
