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Novellus 02-351553-0数字动态控制器

发布时间:2026-07-03人气:
  • Novellus 02-351553-0数字动态控制器
  • Novellus 02-351553-0数字动态控制器
  • Novellus 02-351553-0数字动态控制器

Novellus 02-351553-0数字动态控制器 

1.产 品 资 料 介 绍:

Novellus 02-351553-0 数字动态控制器

开头:Novellus 02-351553-0 是诺发半导体薄膜沉积设备专用数字控制板卡,动态调控腔体等离子、气路与温度参数,保障薄膜工艺均匀稳定。
  1. 高速数字信号处理,实时动态调节工艺各项参数
  2. 多通道同步采集压力、温度、流量传感器信号
  3. 内置光电隔离电路,隔绝射频腔体电磁干扰
  4. 多层屏蔽 PCB 设计,降低等离子杂波影响
  5. 闭环 PID 动态调控,抑制工艺参数波动漂移
  6. 硬件安全联锁,超温、超压自动切断工艺输出
  7. 标准机架插卡式结构,机柜拆装替换便捷
  8. 原厂专属设备通讯协议,对接整机无需调试
  9. 本地存储多套工艺配方,断电参数不丢失
  10. 多路数字 IO 输出,管控阀组、加热、射频单元
  11. 状态指示灯直观显示运行、报警、待机状态
  12. 洁净级工业元器件,适配无尘晶圆车间环境
  13. 0-50℃宽温区间,支持 24 小时不间断量产
  14. 过压、过流、短路三重硬件防护设计
  15. 适配 Novellus 系列 PVD/CVD 薄膜沉积整机结尾:Novellus 02-351553-0 为薄膜工艺核心动态控制组件,稳定控制镀膜全程,保证晶圆薄膜均匀度。

Novellus 02-351553-0数字动态控制器  产品英文

Novellus 02-351553-0 Digital Dynamic Controller

Introduction: Novellus 02-351553-0 is a specialized digital control board for Nofa Semiconductor thin film deposition equipment, which dynamically regulates the plasma, gas path, and temperature parameters of the cavity to ensure uniform and stable thin film processes.

High speed digital signal processing, real-time dynamic adjustment of various process parameters

Multi channel synchronous acquisition of pressure, temperature, and flow sensor signals

Built in optoelectronic isolation circuit to isolate electromagnetic interference from RF cavities

Multi layer shielding PCB design reduces the impact of plasma clutter

Closed loop PID dynamic control to suppress process parameter fluctuations and drift

Hardware safety interlock, automatic cut-off of process output for overheating and overpressure

Standard rack plug-in card structure, easy disassembly and replacement of cabinets

Original factory exclusive equipment communication protocol, no debugging required for docking the entire machine

Local storage of multiple sets of process formulas, without loss of power-off parameters

Multi channel digital IO output, control valve group, heating, RF unit

The status indicator light intuitively displays the running, alarm, and standby states

Clean grade industrial components, suitable for dust-free wafer workshop environment

0-50 ℃ wide temperature range, supporting 24-hour uninterrupted mass production

Triple hardware protection design for overvoltage, overcurrent, and short circuit

Compatible with Novellus series PVD/CVD thin film deposition machine

Conclusion: Novellus 02-351553-0 is the core dynamic control component of thin film technology, which stably controls the entire coating process and ensures the uniformity of wafer thin film.

Novellus 02-351553-0数字动态控制器  产品展示

02-351553-0 (1).jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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