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Hitachi M-05A2LS-400K 射频控制器

发布时间:2026-08-05人气:
  • Hitachi M-05A2LS-400K 射频控制器
  • Hitachi M-05A2LS-400K 射频控制器

Hitachi M-05A2LS-400K 射频控制器 

1.产 品 资 料 介 绍:

Hitachi M-05A2LS-400K
1、M-05A2LS-400K 适配日立半导体刻蚀设备专用射频控制单元
2、额定 400KHz 工作频段,精准调控射频输出功率与频率
3、闭环实时采样反馈,射频输出功率稳定波动极小
4、自带功率自动校准,长期运行参数不易偏移
5、内置过功率、过温、驻波过高多重硬件保护
6、模块化卡式插拔结构,拆装替换检修便捷省事
7、洁净室级元器件,适配无尘晶圆生产车间环境
8、内置射频滤波电路,抑制杂散信号避免干扰腔体工艺
9、光电隔离 IO 接口,对接整机联锁与状态采集信号
10、温控散热设计,长时间满载工作温升控制平稳
11、可与设备主控通讯联动,远程下发工艺参数
12、具备运行数据记录,留存异常工况便于故障溯源
13、加固 PCB 线路,设备震动工况下不易虚焊脱焊
14、功率升降速平缓可控,防止腔体等离子体剧烈波动
15、出厂高精度电性校准,保障半导体制程一致性
Hitachi M-05A2LS-400K 半导体工艺专用射频控制器,稳定管控腔体等离子射频能量输出。

Hitachi M-05A2LS-400K 射频控制器   产品英文介绍

Hitachi M-05A2LS-400K

1. M-05A2LS-400K is compatible with Hitachi semiconductor etching equipment dedicated RF control unit

2. Rated 400KHz operating frequency band, precise control of RF output power and frequency

3. Closed loop real-time sampling feedback, stable RF output power with minimal fluctuations

4. Equipped with automatic power calibration, long-term operation parameters are not easily offset

5. Built in multiple hardware protections for over power, over temperature, and high standing wave

6. Modular card insertion and removal structure, easy to disassemble, replace, and repair, saving time and effort

7. Cleanroom grade components, suitable for dust-free wafer production workshop environment

8. Built in RF filtering circuit to suppress stray signals and avoid interference with cavity technology

9. Optoelectronic isolation IO interface, connected to the whole machine interlocking and status acquisition signals

10. Temperature controlled heat dissipation design, stable temperature rise control during long-term full load operation

11. Can communicate and link with the equipment master to remotely issue process parameters

12. Having operational data records and retaining abnormal operating conditions for easy fault tracing

13. Strengthen PCB circuits to prevent virtual soldering and detachment under equipment vibration conditions

14. The power rise and fall speed is smooth and controllable, preventing severe fluctuations in the cavity plasma

15. High precision electrical calibration at the factory to ensure consistency in semiconductor processes

Hitachi M-05A2LS-400K semiconductor process specific RF controller, stable control of cavity plasma RF energy output.

Hitachi M-05A2LS-400K 射频控制器 产品展示

M-05A2LS-400K (1).jpg

视频展示

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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