1.产 品 资 料 介 绍:
LAM 853-276839-050射频电源组件 产品英文介绍
The LAM 853-276839-050 RF power module is a supporting RF power unit for the Panlin etching equipment, responsible for outputting RF energy to excite plasma, achieving power supply and real-time control of wafer etching process, and ensuring stable plasma discharge.
Product application areas
1. Power supply for plasma dry etching of semiconductor silicon wafers
2. RF energy output control of dielectric layer etching cavity
3. Plasma excitation in metal thin film etching process
4. RF power regulation of advanced process ICP etching equipment
5. High aspect ratio etching process for wafers with stable power output
6. Semiconductor etching cavity RF matching collaborative work
7. Replacement of spare parts for Panlin equipment in the front-end process of chips
8. RF energy supply for plasma cleaning equipment
9. Power closed-loop control of semiconductor thin film removal process
10. Replacement of spare parts for RF faults in semiconductor process chambers
Product Specifications
1. Equipment adaptation: Dedicated LAM etching host platform matched with RF power supply assembly
2. Core functions: RF power output, power sampling, and feedback regulation
3. Process characteristics: Fast power response, suitable for pulse plasma etching conditions
The LAM 853-276839-050 RF power supply component can accurately and stably output RF energy, maintain stable plasma state, ensure wafer etching uniformity, and reduce equipment downtime for maintenance.

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218




