KLA-Tencor 710-609995-003 反射发电机模块
1.产 品 资 料 介 绍：
中文资料：
KLA Tencor 710-609995-003 反射发电机模块
产品概述
KLA Tencor 710-609995-003 是一款用于半导体检测系统中的 反射发电机模块，主要负责生成高精度的反射信号，用于支持光学测量系统中的反射率分析、光路校准及缺陷检测功能。它通常集成于晶圆检测设备、薄膜测量仪器或其他涉及反射光谱分析的系统中，是实现亚微米级测量准确度的关键电子模块之一。
核心功能与作用
反射信号生成
产生稳定且可调节的反射光源，用于校准设备的反射率测量系统。
辅助光学路径校准
在复杂的光路结构中提供基准信号，以便系统自动校正光源偏移或检测漂移。
配合干涉测量模块工作
支持薄膜干涉测量和多层膜厚度检测，提高光学分析系统的精度和重复性。
精密驱动与控制
通过集成电路实现高频率、低噪声的输出控制，可精确调节光源强度与频率。
典型应用领域
| 应用方向 | 说明 |
|---|---|
| 晶圆表面检测 | 用于生成标准化的反射信号，识别表面缺陷、刮痕、颗粒等 |
| 光学量测系统 | 配合反射率测量工具校正系统响应，提升精度 |
| 层厚分析 | 在多层膜系统中，通过反射数据反推膜层厚度 |
| 半导体过程监控 | 实时反馈晶圆制程状态，用于工艺控制闭环系统 |
| 光路对准系统 | 提供参考信号，协助对准系统自动校正焦点和位置 |
技术参数（参考）
工作电压：+12V / +24V（依设备配置）
输出控制频率：可调（几十 kHz 至 MHz 级）
调制模式：PWM 或线性调制
输出接口：模拟/数字信号混合，或通过背板通信
温度范围：0°C ~ 50°C 工业标准
兼容系统：KLA Surfscan、PUMA、SPxx 系列等晶圆检测设备
英文资料：
KLA Tencor 710-609995-003 Reflective Generator Module
product overview
KLA Tencor 710-609995-003 is a reflection generator module used in semiconductor detection systems, mainly responsible for generating high-precision reflection signals to support reflectivity analysis, optical path calibration, and defect detection functions in optical measurement systems. It is typically integrated into wafer inspection equipment, thin film measurement instruments, or other systems involving reflectance spectroscopy analysis, and is one of the key electronic modules for achieving sub micron level measurement accuracy.
Core functions and roles
Reflection signal generation
Generate a stable and adjustable reflective light source for calibrating the reflectivity measurement system of the equipment.
Auxiliary optical path calibration
Provide reference signals in complex optical path structures for the system to automatically correct light source offset or detect drift.
Cooperate with the interferometric measurement module for operation
Support thin film interferometry measurement and multi-layer film thickness detection to improve the accuracy and repeatability of optical analysis systems.
Precision Drive and Control
By using integrated circuits to achieve high-frequency and low-noise output control, the intensity and frequency of the light source can be accurately adjusted.
Typical application areas
Application Direction Description
Wafer surface inspection is used to generate standardized reflection signals, identify surface defects, scratches, particles, etc
Optical measurement system combined with reflectivity measurement tool to calibrate system response and improve accuracy
Layer thickness analysis in multilayer film systems involves inferring the thickness of the film layer through reflection data
Real time feedback of wafer process status for semiconductor process monitoring, used in process control closed-loop systems
The optical alignment system provides reference signals to assist the alignment system in automatically correcting focus and position
Technical parameters (reference)
Working voltage:+12V/+24V (depending on equipment configuration)
Output control frequency: adjustable (tens of kHz to MHz level)
Modulation mode: PWM or linear modulation
Output interface: mixed analog/digital signals, or communication through backplane
Temperature range: 0 ° C~50 ° C Industrial standard
Compatible systems: KLA Surfscan, PUMA, SPxx series and other wafer inspection equipment
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
