TEL Tokyo Electron 381-642664-1模拟输入电子模块
1.产 品 资 料 介 绍:
中文资料:
一、基本信息
产品型号:381-642664-1
产品名称:模拟输入电子模块(Analog Input Electronic Module)
制造商:Tokyo Electron Limited(TEL,日本东京电子)
模块类型:模拟信号采集输入单元
修订号:-1(表示该模块的初始或第 1 版)
二、主要功能
该模块主要用于采集来自现场设备的模拟信号输入,为系统提供高精度参数输入数据,用于控制、监测与反馈。
功能类别 | 描述 |
---|---|
模拟信号采集 | 接收 0–10V、4–20mA、RTD、热电偶等类型的模拟信号 |
数据转换 | 将模拟信号转换为系统可识别的数字数据(通常通过 ADC) |
工艺监控 | 实时监测温度、压力、流量、电压、电流等物理量 |
信号隔离 | 具备电气隔离功能,防止噪声干扰及地环流影响系统稳定性 |
通讯支持 | 与主控制器(PLC、工艺计算单元)进行数据通信,实现控制闭环 |
三、典型应用场景
该模块广泛用于 TEL 半导体设备中的各种精密测量环节,常见用途包括:
光刻前后处理系统
采集加热平台温度、液体流量、环境压力等模拟量信号
CVD / PVD 薄膜沉积设备
监控加热腔体温度、反应气体流量、冷却系统温差等
蚀刻设备
实时测量腔体内温度、电流、电压、气体密度等工艺参数
晶圆搬运系统
采集气动元件压力、电机反馈电流等参数,提升搬运精度和安全性
英文资料:
1、 Basic Information
Product model: 381-642664-1
Product Name: Analog Input Electronic Module
Manufacturer: Tokyo Electron Limited (TEL, Tokyo Electronics, Japan)
Module type: Analog signal acquisition input unit
Revision number: -1 (indicating the initial or first edition of this module)
2、 Main functions
This module is mainly used to collect analog signal inputs from field devices, providing high-precision parameter input data for the system for control, monitoring, and feedback.
Functional category description
Analog signal acquisition and reception of 0-10V, 4-20mA, RTD, thermocouple and other types of analog signals
Data conversion converts analog signals into system recognizable digital data (usually through ADC)
Real time monitoring of physical quantities such as temperature, pressure, flow rate, voltage, and current through process monitoring
Signal isolation has electrical isolation function to prevent noise interference and ground current from affecting system stability
Communication support enables data communication with the main controller (PLC, process computing unit) to achieve closed-loop control
3、 Typical application scenarios
This module is widely used in various precision measurement processes in TEL semiconductor equipment, with common applications including:
Photolithography pre-processing and post-processing system
Collect analog signals such as heating platform temperature, liquid flow rate, and environmental pressure
CVD/PVD thin film deposition equipment
Monitor heating chamber temperature, reaction gas flow rate, cooling system temperature difference, etc
Etching Equipment
Real time measurement of process parameters such as temperature, current, voltage, and gas density inside the cavity
Wafer handling system
Collect parameters such as pneumatic component pressure and motor feedback current to improve handling accuracy and safety
2.产 品 展 示
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
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