TEL Tokyo Electron 2L80-004910-31温度控制器

TEL Tokyo Electron  2L80-004910-31温度控制器

1.产 品 资 料 介 绍：

中文资料：

TEL Tokyo Electron 2L80-004910-31 温度控制器 是一款专为东京电子（TEL）半导体制造设备设计的高精度温控模块，主要用于对工艺过程中的关键温区进行实时监控与闭环控制，确保温度稳定在预设范围内，以满足严格的半导体工艺要求。

一、产品概述

二、核心功能

1. 多通道温度监控

   • 实时读取热电偶、热敏电阻或红外传感器的反馈信号；

   • 支持多个温区独立测温和控制，如腔体壁、基板台、气路管道等。

2. 闭环温控调节

   • 具备PID控制算法，根据设定值与实际值偏差自动调整加热功率或冷却气流；

   • 可实现精度±0.1°C或更高的控温精度（视应用而定）。

3. 报警与联动保护

   • 超温、开路、短路等异常情况可触发报警并自动断开输出；

   • 与主控系统联动，保证设备运行安全。

三、应用场景

1. 晶圆加热台温控

   • 用于涂胶显影设备、清洗机、等离子蚀刻机等的加热平台或烘烤站控制。

2. 真空腔体温度调节

   • 控制腔体壁面温度，防止冷凝或影响真空工艺环境稳定性。

3. 气路/化学液体温控

   • 保持气体或化学液在传输过程中的温度稳定，确保工艺一致性。

英文资料：

The TEL Tokyo Electron 2L80-004910-31 temperature controller is a high-precision temperature control module designed specifically for Tokyo Electronics (TEL) semiconductor manufacturing equipment. It is mainly used for real-time monitoring and closed-loop control of key temperature zones during the process, ensuring that the temperature remains stable within the preset range to meet strict semiconductor process requirements.

1、 Product Overview

Project Content

Product Name: Temperature Controller

Product model 2L80-004910-31

Manufacturer Tokyo Electron Ltd

Application type: Precision temperature control module

2、 Core functions

Multi channel temperature monitoring

Real time reading of feedback signals from thermocouples, thermistors, or infrared sensors;

Support independent temperature measurement and control of multiple temperature zones, such as chamber walls, substrate platforms, gas pipelines, etc.

Closed loop temperature control regulation

Equipped with PID control algorithm, automatically adjust heating power or cooling airflow based on the deviation between the set value and the actual value;

It can achieve temperature control accuracy of ± 0.1 ° C or higher (depending on the application).

Alarm and linkage protection

Abnormal conditions such as overheating, open circuit, and short circuit can trigger an alarm and automatically disconnect the output;

Integrate with the main control system to ensure the safe operation of the equipment.

3、 Application scenarios

Temperature control of wafer heating table

Used for controlling heating platforms or baking stations in coating and developing equipment, cleaning machines, plasma etching machines, etc.

Vacuum chamber temperature regulation

Control the temperature of the chamber wall to prevent condensation or affect the stability of the vacuum process environment.

Gas path/chemical liquid temperature control

Maintain temperature stability of gases or chemical liquids during transportation to ensure process consistency.

2.产      品      展      示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218