AMAT Applied Materials 0010-90811控制器模块

AMAT Applied Materials  0010-90811控制器模块

1.产 品 资 料 介 绍：

产品概述

AMAT 0010-90811 控制器模块是 Applied Materials 半导体制造设备中的关键部件，主要用于 气体供应与工艺控制系统。该模块通过精确的气体流量、压力和阀门状态调节，确保腔体环境满足工艺要求。它广泛应用于刻蚀、沉积、离子注入等核心工艺环节，对保证半导体制造的一致性和高良率起到重要作用。

技术参数（推断类信息，具体数值因未公开可能略有差异）

• 功能类型：气体控制器模块

• 控制对象：工艺气体（如 BF₃、高纯工艺气体等）

• 输入电源：通常为低压直流供电（24V DC 常见）

• 信号接口：支持与上位系统控制器（PLC 或 AMAT 专用主控系统）通信

• 监测功能：压力、阀门状态、流量反馈

• 控制模式：闭环控制，支持快速响应与高精度调节

• 设计特性：耐高纯气体腐蚀、适应洁净室真空工艺环境

应用场景

1. 半导体工艺气体供给

   • 精确调节工艺气体流量，用于 CVD、PVD、刻蚀、离子注入等工艺。

2. 真空腔体环境控制

   • 在真空工艺腔中调节气体压力与比例，确保工艺稳定运行。

3. 安全与保护

   • 提供气体状态监控（流量、压力、阀门位置），在异常情况时触发保护措施。

4. 工艺精度与一致性

   • 实现闭环反馈，保持气体参数稳定，确保晶圆加工质量一致。

产品优势

• 高精度控制：确保气体流量和压力稳定，提升工艺良率。

• 高可靠性：经过 AMAT 严格认证，适配半导体洁净室环境。

• 快速响应：能快速调整气体状态，满足复杂工艺的动态需求。

• 安全保障：内置状态监控与异常保护功能，提高设备运行安全性。

• 模块化设计：作为 AMAT 设备的标准化控制模块，方便更换与维护。

AMAT Applied Materials 0010-90811控制器模块 英文资料：

Product Overview

The AMAT 0010-90811 controller module is a key component in Applied Materials semiconductor manufacturing equipment, mainly used for gas supply and process control systems. This module ensures that the chamber environment meets process requirements through precise adjustment of gas flow rate, pressure, and valve status. It is widely used in core processes such as etching, deposition, and ion implantation, playing an important role in ensuring consistency and high yield in semiconductor manufacturing.

Technical parameters (inferential information, specific values may vary slightly due to undisclosed information)

Function type: Gas controller module

Control object: Process gases (such as BF ∝, high-purity process gases, etc.)

Input power supply: usually low voltage DC power supply (24V DC is common)

Signal interface: supports communication with the upper system controller (PLC or AMAT dedicated main control system)

Monitoring function: pressure, valve status, flow feedback

Control mode: closed-loop control, supporting fast response and high-precision adjustment

Design features: resistant to high-purity gas corrosion, adaptable to clean room vacuum process environment

Application scenarios

Semiconductor process gas supply

Accurately adjust the process gas flow rate for CVD, PVD, etching, ion implantation and other processes.

Vacuum chamber environment control

Adjust the gas pressure and proportion in the vacuum process chamber to ensure the stable operation of the process.

Security and protection

Provide gas status monitoring (flow rate, pressure, valve position) and trigger protective measures in case of abnormal situations.

Process accuracy and consistency

Implement closed-loop feedback, maintain stable gas parameters, and ensure consistent wafer processing quality.

Product advantages

High precision control: Ensure stable gas flow and pressure, and improve process yield.

High reliability: certified by AMAT and suitable for semiconductor cleanroom environments.

Quick response: able to quickly adjust the gas state to meet the dynamic requirements of complex processes.

Security guarantee: Built in status monitoring and abnormal protection functions improve the safety of device operation.

Modular design: As a standardized control module for AMAT equipment, it is easy to ｒｅｐｌａｃｅ and maintain.

AMAT Applied Materials 0010-90811控制器模块 产品展示      

 产品视频

3.其他产品

Horner Electric HE693MPXCBL适配器电缆
Horner Electric HE693THM884M输入模块
Horner Electric HE693DAC420D隔离分析输出模块

4.其他英文产品

ALSTOM AS111-1 Control card
YOKOGAWA ATK4A-00 terminal
CP238TA Expansion CARDS

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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