1.产 品 资 料 介 绍：
ADVANCED ENERGY 3151801-004 远程等离子源产品特点
开头：ADVANCED ENERGY 3151801-004 适配半导体腔体清洗，性能稳定好用。
自带匹配网络，适配各类工艺工况
大功率输出，清洗气体分解充分
双电极点火，启动不易失败
混合散热，长时间运行不高温
防腐腔体，产尘量低
功率检测精准，工艺一致性好
兼容多种工艺气体，适用范围广
模块化结构，检修拆装简单
多通讯接口，方便整机配套
冷却用水少，节省使用成本
电极损耗低，整机寿命更长
体积小巧，可直接替换同类型设备
多重安全保护，异常自动停机
活性粒子输送稳定，清洗效果均匀
防尘抗干扰，适合洁净厂房使用
结尾：ADVANCED ENERGY 3151801-004 易维护、运行稳定，是晶圆设备清洗优选等离子源。
Yaskawa ERCR-NS00-A006机器人控制器 产品英文
ADVANCED ENERGY 3151801-004 Remote Plasma Source Product Features
Introduction: ADVANCED ENERGY 3151801-004 is suitable for semiconductor cavity cleaning, with stable and user-friendly performance.
Equipped with a matching network, suitable for various process conditions
High power output, thorough decomposition of cleaning gas
Dual electrode ignition, less likely to fail during startup
Mixed heat dissipation, long-term operation without high temperature
Anti corrosion chamber with low dust production
Accurate power detection and good process consistency
Compatible with multiple process gases, with a wide range of applications
Modular structure, easy maintenance and disassembly
Multiple communication interfaces for easy matching of the entire machine
Less cooling water, saving usage costs
Low electrode loss and longer overall lifespan of the machine
Compact size, can directly ｒｅｐｌａｃｅ devices of the same type
Multiple safety protections, automatic shutdown in case of abnormalities
Stable transportation of active particles and uniform cleaning effect
Dustproof and anti-interference, suitable for use in clean workshops
Conclusion: ADVANCED ENERGY 3151801-004 is easy to maintain and runs stably, making it the preferred plasma source for wafer equipment cleaning.
Yaskawa ERCR-NS00-A006机器人控制器 产品展示
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
