1.产 品 资 料 介 绍：
- 适配 248nm 深紫外波段，短波成像分辨率更高
- 采用石英专用光学镜片，紫外光透过率高
- 无胶水透镜结构，长期紫外照射不老化脱胶
- 全光路色差校正，画面边缘无畸变模糊
- 大数值孔径设计，可捕捉纳米级细微纹路
- 长短焦配套套件，兼顾大范围扫描与精细观测
- 标准通用卡口，直接匹配奥林巴斯检测显微镜
- 镜头外壳防尘防腐蚀，适配无尘车间环境
- 低反光镀膜，减少杂光干扰，成像对比度高
- 短工作距离，近距离观测晶圆表层图形
- 抗紫外老化材质，长期使用性能不衰减
- 搭配紫外光源模块，明暗场观测自由切换
- 适配自动载物台，支持大面积晶圆巡检
- 出厂光学校准，成像尺寸测量精度稳定
- 模块化组装，镜头拆装清洁简单方便结尾：OLYMPUS DUV-KIT-2-2 成像清晰耐用，是半导体光刻、晶圆缺陷检测核心光学配件。
OLYMPUS DUV-KIT-2-2显微镜镜头 产品英文
Olympus DUV-KIT-2-2 is a deep ultraviolet lens kit specifically designed for semiconductor wafer inspection, compatible with Olympus MX series industrial microscopes for observing small defects.
Suitable for 248nm deep ultraviolet band, with higher resolution for shortwave imaging
Using quartz specific optical lenses with high UV transmittance
Glueless lens structure, long-term UV irradiation does not age or peel off
Full path color difference correction, no distortion or blur at the edges of the image
Large numerical aperture design, capable of capturing nanoscale fine patterns
Long short focal length matching kit, balancing large-scale scanning and fine observation
Standard universal mount, directly matched with Olympus inspection microscope
The lens casing is dust-proof and corrosion-resistant, suitable for dust-free workshop environments
Low reflective coating, reducing stray light interference, high imaging contrast
Short working distance, close observation of wafer surface patterns
Anti UV aging material, long-term performance does not deteriorate
Paired with a UV light source module, allowing for free switching between bright and dark field observations
Adapt to automatic stage and support large-area wafer inspection
Factory optical calibration ensures stable measurement accuracy of imaging dimensions
Modular assembly, easy and convenient disassembly and cleaning of lenses
Conclusion: Olympus DUV-KIT-2-2 has clear and durable imaging, and is a core optical component for semiconductor lithography and wafer defect detection.
OLYMPUS DUV-KIT-2-2显微镜镜头 产品展示
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