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MKS 626B11TDE 压力传感器

发布时间:2026-08-07人气:
  • MKS 626B11TDE 压力传感器
  • MKS 626B11TDE 压力传感器
  • MKS 626B11TDE 压力传感器

MKS 626B11TDE 压力传感器 

1.产 品 资 料 介 绍:

MKS 626B11TDE 压力传感器
1、测量精度高,真空压力数值检测误差小
2、耐受洁净制程工况,适配半导体无尘环境
3、信号输出稳定,长时间监测数据无大幅漂移
4、内部结构耐腐蚀,可接触轻微工艺特种气体
5、温度适应性优秀,腔体温度波动下测量稳定
6、响应速度快,腔体气压变化可以快速捕捉
7、抗外界电磁干扰,周边大功率设备运行不受影响
8、安装结构标准化,机台拆装更换简单方便
9、内置基础防护,轻微压力冲击不会损坏核心元件
10、零点漂移量低,无需频繁反复校准调试
11、密封性优良,接入真空腔体不易出现漏气问题
12、体积小巧,狭小设备腔体内部也可布置安装
13、运行功耗偏低,长时间持续监测负荷小
14、出厂经过严苛标定,上机即可投入正常使用
15、使用寿命长,半导体产线全天候作业耐用性强
MKS 626B11TDE 主要用于半导体镀膜、刻蚀设备腔内高精度真空压力实时监测。

MKS 626B11TDE 压力传感器   产品英文介绍

MKS 626B11TDE pressure sensor

1. High measurement accuracy and small error in vacuum pressure numerical detection

2. Tolerate clean process conditions and adapt to semiconductor dust-free environments

3. Stable signal output, no significant drift in long-term monitoring data

4. The internal structure is corrosion-resistant and can come into contact with mild process specialty gases

5. Excellent temperature adaptability, stable measurement under temperature fluctuations in the chamber

6. Fast response speed, able to quickly capture changes in chamber pressure

7. Resistant to external electromagnetic interference, the operation of surrounding high-power equipment is not affected

8. Standardized installation structure, easy and convenient disassembly and replacement of the machine

9. Built in basic protection, slight pressure impact will not damage core components

10. Low zero drift, no need for frequent calibration and debugging

11. Excellent sealing performance, less likely to cause air leakage when connected to the vacuum chamber

12. Compact in size, the small device cavity can also be arranged and installed inside

13. Low operating power consumption, low load for long-term continuous monitoring

14. After rigorous calibration at the factory, it can be put into normal use immediately upon installation

15. Long service life, strong durability for all-weather operation of semiconductor production lines

MKS 626B11TDE is mainly used for high-precision real-time monitoring of vacuum pressure inside semiconductor coating and etching equipment chambers.

MKS 626B11TDE 压力传感器 产品展示

mks_626b11tde_baratrn_capacitance_manometer_vacuum_gauge_range_10_torr.jpg

视频展示

中文产品

WESTINGHOUSE 1C31169G02 自动化控制模块
 07CR41 1SBP260020R1001 涡流传感器
GE CM400RGICH1ACB 电路板模块

英文产品

DSAI133A 3BSE018290R1 Output expansion card
FBM230 P0926GU Output the electronic module
GE IC693PWR322F Industrial control card

6ES5998-0MA34531X113PSFASG1710-659465-20
6ES5998-0KP21531X111PSHACG1281-242600-2
6ES5998-0DD51531X111PSHASG3710-658041-20
6ES5998-0CM01531X111PSHASG2720-24609-002
6ES5997-3UR11531X100CCHARM1F31X170TBSAAG1
6ES5988-3NB41193x730AFG02F31X139APMAKG2

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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