1.产 品 资 料 介 绍:
MKS 626B11TDE 压力传感器 产品英文介绍
MKS 626B11TDE pressure sensor
1. High measurement accuracy and small error in vacuum pressure numerical detection
2. Tolerate clean process conditions and adapt to semiconductor dust-free environments
3. Stable signal output, no significant drift in long-term monitoring data
4. The internal structure is corrosion-resistant and can come into contact with mild process specialty gases
5. Excellent temperature adaptability, stable measurement under temperature fluctuations in the chamber
6. Fast response speed, able to quickly capture changes in chamber pressure
7. Resistant to external electromagnetic interference, the operation of surrounding high-power equipment is not affected
8. Standardized installation structure, easy and convenient disassembly and replacement of the machine
9. Built in basic protection, slight pressure impact will not damage core components
10. Low zero drift, no need for frequent calibration and debugging
11. Excellent sealing performance, less likely to cause air leakage when connected to the vacuum chamber
12. Compact in size, the small device cavity can also be arranged and installed inside
13. Low operating power consumption, low load for long-term continuous monitoring
14. After rigorous calibration at the factory, it can be put into normal use immediately upon installation
15. Long service life, strong durability for all-weather operation of semiconductor production lines
MKS 626B11TDE is mainly used for high-precision real-time monitoring of vacuum pressure inside semiconductor coating and etching equipment chambers.
MKS 626B11TDE 压力传感器 产品展示

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218



