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Lam 853-232450-002换热底座装配

发布时间:2026-09-08人气:
  • Lam 853-232450-002换热底座装配
  • Lam 853-232450-002换热底座装配
  • Lam 853-232450-002换热底座装配

Lam 853-232450-002换热底座装配 

1.产 品 资 料 介 绍:

Lam 853‑232450‑002 换热底座装配,刻蚀机腔室内部静电吸盘配套冷却基座组件。
产品特点:
1、导热接触均匀,保障晶圆温控稳定,片内温差小
2、耐腐蚀腔体适配材质,耐受刻蚀工艺气体侵蚀
3、集成冷却流道与密封结构,原位整体拆装更换
4、承压密封可靠,减少漏水漏气风险
5、适配产线连续生产,长期运行形变小
产品参数:
1、匹配刻蚀设备腔体安装定位接口
2、内置冷却水路,实现热量快速传导
3、适配设备工艺温度区间,满足温控需求
4、集成密封件,保障水路、腔体密封性能
5、可配合机台温度传感完成温度反馈
应用领域:
1、Lam 刻蚀设备 ESC 静电吸盘冷却承载基座
2、等离子刻蚀腔室晶圆工位热交换作业
3、半导体刻蚀工艺晶圆温度管控配套
4、泛林刻蚀设备底座老化损坏备件替换
5、腔体维护保养后整套基座装配调试
Lam 853‑232450‑002 直接决定晶圆散热效果,对刻蚀工艺均匀性与良率起到关键作用。

Lam 853-232450-002换热底座装配 产品英文介绍

Assembly of Lam 853-23245-002 heat exchange base, equipped with internal electrostatic suction cups and cooling base components for etching machine chamber.

Product Features:

1. Uniform thermal contact ensures stable temperature control of the wafer and small temperature difference inside the wafer

2. Corrosion resistant chamber compatible material, resistant to etching process gas erosion

3. Integrated cooling channel and sealing structure, in-situ disassembly and replacement as a whole

4. Reliable pressure sealing reduces the risk of water and gas leakage

5. Suitable for continuous production on the production line, with minimal deformation during long-term operation

Product Parameters:

1. Matching etching equipment cavity installation positioning interface

2. Built in cooling water circuit for rapid heat transfer

3. Adapt equipment process temperature range to meet temperature control requirements

4. Integrated sealing components ensure the sealing performance of waterways and chambers

5. Can cooperate with machine temperature sensing to complete temperature feedback

Application fields:

1. Lam etching equipment ESC electrostatic suction cup cooling support base

2. Plasma etching chamber wafer workstation heat exchange operation

3. Supporting temperature control for semiconductor etching process wafers

4. Replacement of spare parts for the aging and damaged base of the Panlin etching equipment

5. After maintenance and upkeep of the cavity, assemble and debug the entire base

Lam 853-23245-002 directly determines the heat dissipation effect of the wafer and plays a key role in the uniformity and yield of the etching process.

Lam 853-232450-002换热底座装配 产品展示

853-232450-002.webp (2).jpg

视频展示


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PPC-IPC-SGENERA  G2010 A 10.4ST6DD2920-0AM0

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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