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LAM 853-172610-003输出射频匹配模块

发布时间:2026-09-08人气:
  • LAM 853-172610-003输出射频匹配模块
  • LAM 853-172610-003输出射频匹配模块
  • LAM 853-172610-003输出射频匹配模块

LAM 853-172610-003输出射频匹配模块 

1.产 品 资 料 介 绍:

LAM 853‑172610‑003 输出射频匹配模块,是刻蚀机射频链路末端阻抗匹配组件。
产品特点:
1、射频功率传输损耗低,高效把功率输送到工艺腔体
2、负载波动下快速完成阻抗匹配,抑制反射功率
3、耐等离子环境,抗工艺气体腐蚀,使用寿命长
4、整体模块化总成,现场直接拆装,不用拆分内部器件
5、自带驻波超限防护,减少射频源被反向功率损伤
产品参数:
1、适配泛林刻蚀设备原有射频接口与安装位
2、采集输出端驻波、相位数据反馈整机系统
3、适配机柜及腔体周边工作温度环境
4、匹配机台射频功率等级,满足工艺功率输出
5、异常状态输出告警信号,方便维修排查
应用领域:
1、LAM 刻蚀设备射频回路末端阻抗匹配
2、等离子刻蚀腔室射频功率传输适配
3、半导体干法刻蚀工艺射频链路配套
4、产线匹配模块老化损坏备件替换
5、腔体保养维护后射频链路调试校验
LAM 853‑172610‑003 把控射频链路末端阻抗状态,直接影响腔室等离子稳定性与刻蚀均匀度

LAM 853-172610-003输出射频匹配模块 产品英文介绍

LAM 853-172610-003 output RF matching module is the impedance matching component at the end of the RF link of the etching machine.

Product Features:

1. Low RF power transmission loss, efficient delivery of power to the process chamber

2. Quickly achieve impedance matching under load fluctuations and suppress reflected power

3. Resistant to plasma environment, resistant to process gas corrosion, long service life

4. The overall modular assembly can be directly disassembled and assembled on site without the need to disassemble internal components

5. Equipped with standing wave over limit protection, reducing damage to the RF source caused by reverse power

Product Parameters:

1. Adapt to the original RF interface and installation position of the pan forest etching equipment

2. Collect standing wave and phase data from the output end and provide feedback to the entire system

3. Adapt to the working temperature environment around the cabinet and cavity

4. Match the RF power level of the machine to meet the process power output requirements

5. Abnormal state output alarm signal, convenient for maintenance and troubleshooting

Application fields:

1. Impedance matching at the end of the RF circuit of LAM etching equipment

2. Adaptation of RF power transmission in plasma etching chamber

3. Semiconductor dry etching process RF link matching

4. Replacement of aging and damaged spare parts in the matching module of the production line

5. RF link debugging and verification after cavity maintenance and upkeep

LAM 853-172610-003 controls the impedance state at the end of the RF link, directly affecting the stability of the chamber plasma and the uniformity of etching

LAM 853-172610-003输出射频匹配模块 产品展示

853-172610-003.webp.jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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