Koshuha MBA-010-H-2射频匹配箱

Koshuha MBA-010-H-2射频匹配箱 

1.产 品 资 料 介 绍：

Koshuha MBA-010-H-2射频匹配箱  产品英文介绍

Koshuha MBA-010-H-2 is a high-frequency RF matching box used for impedance matching between RF power supplies and process chambers to reduce reflected power.

1. Built in automatic tuning capacitor, quickly matches when the cavity impedance changes, reducing RF return loss;

2. Integrated harmonic filtering module to suppress clutter interference and protect the RF host;

3. Water cooling and heat dissipation design, temperature control for long-term continuous operation;

4. Equipped with communication interface, it can be linked with the device and report the matching status in real time;

5. Compact size, easy to install inside semiconductor etching and deposition machines.

1. Rated power of 1kW;

2. Operating frequency 13.56MHz;

3. Standard impedance of 50 Ω;

4. Matching filter model FLU-450B-03;

5. Adopt water-cooled cooling.

1. RF impedance matching of semiconductor plasma etching chamber;

2. RF circuit adjustment of PVD thin film deposition equipment;

3. CVD plasma process chamber power matching;

4. RF system matching for plasma cleaning equipment;

5. Impedance adaptation of various wafer plasma process equipment.

This MBA-010-H-2 matching response is stable, ensuring stable plasma process power, and is a commonly used RF matching component in semiconductor equipment.

Koshuha MBA-010-H-2射频匹配箱  产品展示

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218