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ENI OEM-6B-01M3射频发生器

发布时间:2026-09-10人气:
  • ENI OEM-6B-01M3射频发生器
  • ENI OEM-6B-01M3射频发生器
  • ENI OEM-6B-01M3射频发生器

ENI OEM-6B-01M3射频发生器 

1.产 品 资 料 介 绍:

ENI OEM-6B-01M3 射频发生器,半导体等离子工艺常用固态射频电源,输出稳定。
产品特点:
1. 固态射频电路,功率输出平稳,工艺一致性好
2. 自带功率反射保护,负载异常时快速保护主机
3. 机架紧凑结构,机柜安装不占多余空间
4. 支持通讯信号反馈,方便上位机监控状态
5. 抗干扰能力强,长时间产线连续运行可靠
产品参数:
1. 型号:OEM-6B-01M3
2. 工作频率:13.56MHz
3. 额定输出功率:650W
4. 输入供电:208V 单相交流
5. 通讯接口:RS232
应用领域:
1. 半导体刻蚀工艺等离子供电
2. 薄膜沉积设备射频源
3. 晶圆等离子清洗设备
4. 材料表面改性处理设备
5. 旧半导体机台射频电源备件替换
等离子工艺设备维修更换,ENI OEM-6B-01M3 射频发生器适配性很好。

ENI OEM-6B-01M3射频发生器  产品英文介绍

ENI OEM-6B-01M3 RF generator, a commonly used solid-state RF power supply in semiconductor plasma processes, with stable output.

Product Features:

1. Solid state RF circuit with stable power output and good process consistency

2. Equipped with power reflection protection, it quickly protects the host in case of abnormal load

3. Compact rack structure, cabinet installation does not take up extra space

4. Support communication signal feedback, convenient for the upper computer to monitor the status

5. Strong anti-interference ability, reliable and continuous operation of the production line for a long time

Product Parameters:

1. Model: OEM-6B-01M3

2. Operating frequency: 13.56MHz

3. Rated output power: 650W

4. Input power supply: 208V single-phase AC

5. Communication interface: RS232

Application fields:

1. Plasma power supply for semiconductor etching process

2. RF source for thin film deposition equipment

3. Wafer plasma cleaning equipment

4. Material surface modification equipment

5. Replacement of RF power supply spare parts for old semiconductor machines

Plasma process equipment maintenance and replacement, ENI OEM-6B-01M3 RF generator has good compatibility.

ENI OEM-6B-01M3射频发生器  产品展示

OEM-6B-01M3.webp.jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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