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Paramount 3156310-041射频发生器

发布时间:2026-09-11人气:
  • Paramount 3156310-041射频发生器
  • Paramount 3156310-041射频发生器
  • Paramount 3156310-041射频发生器

Paramount 3156310-041射频发生器 

1.产 品 资 料 介 绍:

Paramount 3156310-041 射频发生器是 AE 数字型等离子射频电源
1. 全数字化功率控制,输出精度高
2. 内置电弧管理,快速抑制打火
3. 支持脉冲射频输出,适配精细工艺
4. 实时监测阻抗,等离子状态响应快
5. 多通讯协议,方便接入机台主控
1. 型号 3156310-041
2. 机架 3U 安装规格
3. 支持频率微调
4. 水冷 + 风冷混合散热
5. 具备功率日志记录功能
适用场景
1. 半导体介质刻蚀设备
2.PECVD 薄膜沉积工艺
3. 腔体等离子清洁
4. 半导体设备备件替换
5.ALD 等离子制程供电
总的来说 Paramount 3156310-041 是 AE 成熟数字射频源,刻蚀沉积设备维修常用备件

Paramount 3156310-041射频发生器  产品英文介绍

Paramount 3156310-041 RF generator is an AE digital plasma RF power supply

1. Fully digital power control, high output accuracy

2. Built in arc management to quickly suppress ignition

3. Support pulse RF output and adapt to fine craftsmanship

4. Real time monitoring of impedance, fast response to plasma state

5. Multiple communication protocols for easy access to the main control of the machine

1. Model 3156310-041

2. Installation specifications for rack 3U

3. Support frequency fine-tuning

4. Water cooling+air cooling mixed heat dissipation

5. Equipped with power logging function

Applicable scenarios

1. Semiconductor dielectric etching equipment

2. PECVD thin film deposition process

3. Plasma cleaning of the cavity

4. Replacement of spare parts for semiconductor equipment

5. ALD plasma process power supply

Overall, Paramount 3156310-041 is an AE mature digital RF source and a commonly used spare part for etching and deposition equipment maintenance

Paramount 3156310-041射频发生器  产品展示

3156310-041.webp.jpg

视频展示


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IC3600SBMA1531X207LCSAEH1IC3600EPZU1C
IC3600SASA1531X207LCSAEG1IC3600EPZU1B

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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