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Mitsubishi FT-1001D-W211涡轮分子泵

发布时间:2026-09-16人气:
  • Mitsubishi FT-1001D-W211涡轮分子泵
  • Mitsubishi FT-1001D-W211涡轮分子泵
  • Mitsubishi FT-1001D-W211涡轮分子泵

Mitsubishi FT-1001D-W211涡轮分子泵 

1.产 品 资 料 介 绍:

三菱 FT-1001D-W211 涡轮分子泵日常使用稳定,是高真空场景常用泵型。
产品特点
运行振动低,不影响精密加工。
无油设计,腔体不会被油污污染。
启动快,自带保护,不容易损坏叶片。
体积小巧,拆装集成比较方便。
可以查看运行状态,方便安排维护。
产品参数
氮气抽速 1000L/s。
极限真空可达 10 的负 8 次方 Pa。
额定转速 33000 转每分钟。
支持 100 至 240 伏宽电压供电。
运行噪音低于 60 分贝。
应用领域
半导体刻蚀与薄膜沉积设备。
光学工件真空镀膜产线。
扫描电镜等表面分析仪器。
高校实验室真空材料实验。
高精度真空检漏设备。
这款分子泵性能均衡,量产和科研场景都能放心选用。

Mitsubishi FT-1001D-W211涡轮分子泵  产品英文介绍

The Mitsubishi FT-1001D-W211 turbo molecular pump is stable in daily use and is a commonly used pump type in high vacuum scenarios.

Product Features

Low operating vibration does not affect precision machining.

Oil free design, the chamber will not be contaminated by oil stains.

Fast startup, built-in protection, and less likely to damage the blades.

Compact in size, easy to disassemble and integrate.

You can check the running status for easy maintenance arrangements.

Product Specifications

Nitrogen pumping rate of 1000L/s.

The ultimate vacuum can reach 10 to the negative 8th power Pa.

The rated speed is 33000 revolutions per minute.

Supports wide voltage supply from 100 to 240 volts.

The operating noise is below 60 decibels.

Application Areas

Semiconductor etching and thin film deposition equipment.

Optical workpiece vacuum coating production line.

Surface analysis instruments such as scanning electron microscopy.

University laboratory vacuum material experiment.

High precision vacuum leak detection equipment.

This molecular pump has balanced performance and can be used with confidence in both mass production and scientific research scenarios.

Mitsubishi FT-1001D-W211涡轮分子泵  产品展示

FT-1001D-W211.webp (3).jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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