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AE 3155999-080射频匹配组件

发布时间:2026-09-24人气:
  • AE 3155999-080射频匹配组件
  • AE 3155999-080射频匹配组件
  • AE 3155999-080射频匹配组件

AE 3155999-080射频匹配组件 

1.产 品 资 料 介 绍:

AE 3155999-080 射频匹配组件,AE 自动阻抗匹配单元,用来匹配工艺腔体阻抗,把射频功率高效送入等离子腔。
产品特点

1. 自适应调谐逻辑,腔体阻抗突变时快速锁定匹配点
2. 内置定向耦合采样,实时采集正向、反射射频功率
3. 电弧检测灵敏,腔体打火瞬间降低功率保护射频源
4. 电容电机驱动平稳,长时间反复调谐不容易卡滞
5. 水冷散热设计,大功率连续工作温升可控
6. 通讯接口适配 AMAT 机台,双向传输匹配状态信息
7. 可调谐区间宽,支持多套工艺配方切换使用
8. 腔体侧射频回路屏蔽做得好,减少对外电磁辐射
9. 自带参数存储,更换腔体后可快速调取预设配方
10. 内部元器件经过老化筛选,量产工况故障率低
应用领域
11. AMAT 等离子刻蚀工艺腔体
12. PVD 薄膜沉积射频回路
13. 晶圆等离子表面改性处理
14. 半导体干法去胶设备
15. 大功率射频等离子工艺系统
AE 3155999-080 射频匹配组件电弧防护灵敏,调谐范围广,是半导体等离子工艺中射频链路的核心配套备件。

AE 3155999-080射频匹配组件  产品英文介绍

AE 3155999-080 RF matching component, AE automatic impedance matching unit, used to match the impedance of the process chamber and efficiently deliver RF power into the plasma chamber.

Product Features


1. Adaptive tuning logic, quickly locking the matching point when the cavity impedance suddenly changes

2. Built in directional coupling sampling, real-time acquisition of forward and reflected RF power

3. The arc detection is sensitive, and the power protection of the RF source is reduced when the cavity ignites

4. The capacitor motor drives smoothly and is not easily stuck after long-term repeated tuning

5. Water cooling and heat dissipation design, high-power continuous operation with controllable temperature rise

6. Communication interface compatible with AMAT machine, bidirectional transmission of matching status information

7. Wide tunable range, supporting switching between multiple process formulas

8. The RF circuit shielding on the cavity side is well done to reduce external electromagnetic radiation

9. Equipped with parameter storage, the preset formula can be quickly retrieved after changing the cavity

10. The internal components have undergone aging screening, resulting in a low failure rate under mass production conditions

Application Areas

11. AMAT plasma etching process chamber

12. PVD thin film deposition RF circuit

13. Plasma surface modification treatment of wafers

14. Semiconductor dry adhesive removal equipment

15. High power RF plasma process system

AE 3155999-080 RF matching component has sensitive arc protection and a wide tuning range, making it a core supporting spare part for RF links in semiconductor plasma processes.

AE 3155999-080射频匹配组件 产品展示

3155999-080.webp (5).jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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