1.产 品 资 料 介 绍：
ENI MWH-5-01自动匹配控制器 产品英文介绍
ENI MWH-5-01 Automatic Matching Controller
Product Features
Wide load impedance automatic fast tuning to maintain stable RF power transmission
Support automatic and remote dual-mode control adaptation to 13.56 MHz RF system
Built in power monitoring and fault protection reduce the risk of RF reflection damage
The serial port and analog signal interface can be directly connected to the main control of the semiconductor machine
The split type tuning and control unit structure is convenient for on-site maintenance and repair
Application Areas
RF impedance matching control of semiconductor plasma etching chamber
Automatic tuning of RF circuit for PVD physical vapor deposition equipment
RF power matching control in CVD thin film deposition process
RF matching unit for plasma modification process on wafer surface
Replacement and maintenance of spare parts for RF matching devices in semiconductor production lines
Refurbishment and renovation of chip equipment, RF system supporting components
RF impedance adjustment of experimental plasma equipment for research and development
RF matching control of photoresist plasma ashing process
RF source and cavity matching unit for vacuum coating equipment
RF power regulation of ICP plasma process chamber
The model of this automatic matching controller used for automatic adjustment of RF impedance in semiconductor plasma equipment is ENI MWH-5-01.
ENI MWH-5-01自动匹配控制器 产品展示
视频展示
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| PMB33C-00216-01 | 07ZW80 | 57120001-PS D SAI 133 |
The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
