TEL Tokyo Electron TW39-000021-11射频自动调音台
1.产 品 资 料 介 绍：
产品名称：
产品名称
TEL Tokyo Electron TW39-000021-11 射频自动调音台
产品类型
射频自动匹配器（RF Auto Matching Unit）
功能简介
该模块用于 Tokyo Electron 半导体设备中，主要用于：
在射频（RF）系统中对阻抗进行自动调谐匹配
使射频功率源与等离子体负载之间达到最佳匹配，降低反射功率
提高能量传输效率，保护射频发生器和负载元件
主要技术特性（典型参数）
工作频率：13.56 MHz 或 40.68 MHz（具体型号决定）
射频功率范围：2kW 至 20kW（依据应用设备功率等级）
反应速度快，适合快速调谐等离子体工艺中的负载变化
自动调整电容/电感匹配网络，实现实时阻抗匹配
应用领域
广泛用于 Tokyo Electron 的以下半导体设备中：
等离子体刻蚀系统
化学气相沉积（CVD）系统
原子层沉积（ALD）设备
清洗设备等涉及高频等离子体的系统
英文资料：
product name
TEL Tokyo Electron TW39-000021-11 RF Automatic Mixing Console
product type
RF Auto Matching Unit
Function Introduction
This module is used in Tokyo Electron semiconductor equipment, mainly for:
Automatic impedance tuning and matching in radio frequency (RF) systems
Achieve optimal matching between RF power source and plasma load, and reduce reflected power
Improve energy transmission efficiency, protect RF generators and load components
Main technical characteristics (typical parameters)
Operating frequency: 13.56 MHz or 40.68 MHz (specific model to be determined)
RF power range: 2kW to 20kW (depending on the power level of the application device)
Fast response speed, suitable for quickly tuning load changes in plasma processes
Automatically adjust the capacitor/inductor matching network to achieve real-time impedance matching
application area
Widely used in the following semiconductor devices of Tokyo Electron:
Plasma etching system
Chemical Vapor Deposition (CVD) System
Atomic Layer Deposition (ALD) equipment
Cleaning equipment and other systems involving high-frequency plasma
2.产 品 展 示
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
