TEL Tokyo Electron 3S80-000007-11涡轮增压泵
1.产 品 资 料 介 绍:
产品名称:
Tokyo Electron (TEL) 3S80-000007-11 涡轮增压泵 — 产品应用领域详解
一、产品功能定位
3S80-000007-11 涡轮增压泵(Turbo Molecular Pump,简称 TMP)是 Tokyo Electron 半导体设备中用于维持真空环境的核心部件之一。它通常用于中高真空段,具有高速旋转叶轮结构,适用于对洁净度、稳定性要求极高的真空工艺。
二、主要应用领域
1. 半导体真空处理设备的真空系统
核心作用:为晶圆加工腔体(如刻蚀腔、CVD 腔、PVD 腔等)提供中高真空环境;
目标真空范围:10⁻³ Pa 至 10⁻⁶ Pa;
典型设备:
等离子刻蚀设备(Etcher)
原子层沉积(ALD)系统
化学气相沉积(CVD)
金属有机化学气相沉积(MOCVD)
2. 高洁净工艺环境维持
无油结构:涡轮分子泵不使用润滑油,杜绝油污染,适用于超高洁净环境;
低振动/低噪音:适合敏感工艺操作,如薄膜沉积、离子注入、真空退火等;
反应控制:为高精度温控、气流控制提供稳定真空基础。
英文资料:
Tokyo Electron (TEL) 3S80-00007-11 Turbocharging Pump - Product Application Field Detailed Explanation
1、 Product functional positioning
The 3S80-00007-11 Turbo Molecular Pump (TMP) is one of the core components used to maintain a vacuum environment in Tokyo Electron semiconductor equipment. It is usually used in medium to high vacuum sections, with a high-speed rotating impeller structure, suitable for vacuum processes that require extremely high cleanliness and stability.
2、 Main application areas
1. Vacuum system of semiconductor vacuum processing equipment
Core function: To provide a medium to high vacuum environment for wafer processing chambers (such as etching chambers, CVD chambers, PVD chambers, etc.);
Target vacuum range: 10 ⁻³ Pa to 10 ⁻⁶ Pa;
Typical equipment:
Plasma etching equipment (Etcher)
Atomic Layer Deposition (ALD) System
Chemical Vapor Deposition (CVD)
Metal Organic Chemical Vapor Deposition (MOCVD)
2. Maintenance of High Cleanliness Process Environment
Oil free structure: The turbo molecular pump does not use lubricating oil, eliminating oil pollution and suitable for ultra clean environments;
Low vibration/low noise: suitable for sensitive process operations such as thin film deposition, ion implantation, vacuum annealing, etc;
Reaction control: provides a stable vacuum foundation for high-precision temperature control and airflow control.
2.产 品 展 示
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218