Tokyo Electron 3D80-000300-13涡轮分子泵

TEL Tokyo Electron 3D80-000300-13涡轮分子泵

1.产 品 资 料 介 绍：

产品名称：

Tokyo Electron 3D80-000300-13 涡轮分子泵 是一款专为半导体制造设备中的高真空工艺环境设计的高性能抽真空设备，通常集成在 Tokyo Electron（TEL）旗下的真空工艺平台中，如蚀刻、沉积、离子注入等系统。以下是该泵的详细应用领域分析：

一、产品功能概述

• 类型：高转速涡轮分子泵

• 功能：在真空腔体中迅速建立并维持高真空（通常在 10⁻⁵ ～ 10⁻⁸ Torr 范围）

• 特性：

  • 高抽速

  • 低振动

  • 可与干式前级泵联动

  • 适用于腐蚀性或惰性气体环境

二、主要应用领域

1. 等离子体蚀刻设备（Plasma Etcher）

• 用于维持腔体内的稳定高真空，确保等离子体均匀形成与反应控制。

• 支持快速抽气响应，满足高通量生产节奏。

2. CVD/ALD 薄膜沉积设备

• 在沉积腔体中保持低压环境，避免杂质颗粒沉积。

• 有助于提高膜层纯度和表面质量。

3. 离子注入设备（Ion Implanter）

• 在离子束注入过程中维持超高真空，减少气体分子与离子的碰撞。

• 提升掺杂精度，降低器件缺陷率。

4. PVD 蒸镀/溅射系统

• 在溅射前快速建立基准真空。

• 在过程中保持稳定真空以控制蒸发材料沉积路径。

5. 测试与分析设备

• 如 SEM、XPS、RIE 等真空依赖型分析仪中，也常配置涡轮分子泵以实现必要真空度。

英文资料：

The Tokyo Electron 3D80-000300-13 turbomolecular pump is a high-performance vacuum pumping device designed specifically for high vacuum process environments in semiconductor manufacturing equipment. It is typically integrated into vacuum process platforms under Tokyo Electron (TEL), such as etching, deposition, ion implantation, and other systems. The following is a detailed analysis of the application areas of the pump:

1、 Product Function Overview

Type: High speed turbo molecular pump

Function: Quickly establish and maintain high vacuum in the vacuum chamber (usually within the range of 10 ⁻⁵ to 10 ⁻⁸ Torr)

characteristic:

High pumping speed

low vibration

Can be linked with the dry front-end pump

Suitable for corrosive or inert gas environments

2、 Main application areas

1. Plasma Etcher

Used to maintain a stable high vacuum inside the cavity, ensuring uniform plasma formation and reaction control.

Support fast pumping response to meet the rhythm of high-throughput production.

2. CVD/ALD thin film deposition equipment

Maintain a low pressure environment in the sedimentation chamber to avoid the deposition of impurity particles.

Helps to improve the purity and surface quality of the film layer.

3. Ion implantation equipment

Maintain ultra-high vacuum during ion beam implantation to reduce collisions between gas molecules and ions.

Improve doping accuracy and reduce device defect rate.

4. PVD evaporation/sputtering system

Quickly establish a reference vacuum before sputtering.

Maintain a stable vacuum during the process to control the deposition path of evaporated materials.

5. Testing and analysis equipment

In vacuum dependent analyzers such as SEM, XPS, RIE, etc., turbo molecular pumps are often configured to achieve the necessary vacuum degree.

2.产      品      展      示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218