Tokyo Electron SBX08-000027-1超声波器

TEL Tokyo Electron SBX08-000027-1超声波器

1.产 品 资 料 介 绍：

产品名称：

Tokyo Electron SBX08-000027-1 超声波器（Ultrasonic Transducer / Cleaner Unit） 是一款用于半导体工艺中超声波清洗或液体处理模块的功能组件，常见于清洗、显影、刻蚀前清洁或高精度材料表面处理等应用场景。该部件通常集成于 TEL 的 清洗设备（Wet Station） 或 显影机台（Clean Track 系列） 中。

一、产品功能概述

• 设备类型：超声波器 / 超声波清洗头 / 超声波换能器

• 主要功能：

  • 通过超声波振动在液体中形成微小气泡（空化效应），去除附着在晶圆表面的微粒、污染物或残胶；

  • 实现无接触式清洗，保障器件结构的完整性与清洁度；

  • 提高显影或湿法刻蚀前的表面质量控制。

二、主要应用领域

1. 晶圆超声清洗（Ultrasonic Wafer Cleaning）

• 用于去除晶圆表面的颗粒、金属离子、微小污染物；

• 常与去离子水（DIW）、氢氟酸（HF）、臭氧水（SC1/SC2）等清洗液协同使用。

2. 光刻后显影工艺

• 清除残留的光刻胶、显影液副产物；

• 提升图形边缘的整洁度，避免后续蚀刻缺陷。

3. 薄膜沉积后清洗

• 移除沉积残渣或防止污染物沉积在晶圆边缘；

• 可用于前处理或中间处理步骤的清洗环节。

英文资料：

The Tokyo Electron SBX08-000027-1 Ultrasonic Transformer/Cleaner Unit is a functional component used for ultrasonic cleaning or liquid processing modules in semiconductor processes. It is commonly used in applications such as cleaning, development, pre etching cleaning, or high-precision material surface treatment. This component is usually integrated into TEL's Wet Station or Clean Track series of developing machines.

1、 Product Function Overview

Equipment type: Ultrasonic cleaner/Ultrasonic cleaning head/Ultrasonic transducer

Main functions:

By using ultrasonic vibration to form tiny bubbles (cavitation effect) in the liquid, particles, pollutants, or residual glue attached to the surface of the wafer can be removed;

Realize contactless cleaning to ensure the integrity and cleanliness of the device structure;

Improve surface quality control before development or wet etching.

2、 Main application areas

1. Ultrasonic Wafer Cleaning

Used to remove particles, metal ions, and small pollutants from the surface of wafers;

Often used in conjunction with cleaning solutions such as deionized water (DIW), hydrofluoric acid (HF), and ozone water (SC1/SC2).

2. Post lithography development process

Remove residual photoresist and developer by-products;

Improve the cleanliness of graphic edges to avoid subsequent etching defects.

3. Cleaning after film deposition

Remove sediment residue or prevent pollutants from depositing at the edge of the wafer;

Can be used in the cleaning process of pre-processing or intermediate processing steps.

2.产      品      展      示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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