1.产 品 资 料 介 绍：
- 规格参数：适配射频功率传输场景，阻抗匹配精度高，兼容标准 50Ω 系统阻抗；紧凑模块化结构，适配标准机柜或设备集成安装
- 接口配置：含射频输入 / 输出接口、控制信号接口及状态诊断端口，支持与射频电源联动控制
- 可靠性：经严格功能检测，具备过流、过压保护机制，维护便捷，运行稳定性高，符合工业设备长期服役要求
- 典型场景：半导体晶圆蚀刻 / 溅射工艺、通信基站射频系统、等离子体处理设备、雷达发射接收系统
- 核心价值：提升射频能量传输效率，减少设备发热与故障停机，保障工艺稳定性（如等离子体点火成功率、溅射速率均匀性），助力工业生产与通信系统高效运行
853-064887-061射频匹配器 英文资料：
Core positioning
The industrial grade 853-064887-061 RF matching device is designed to achieve precise impedance matching between RF power supply and loads (such as plasma and sputtering targets), convert load impedance into power standard output impedance (usually 50 Ω), maximize RF energy transmission efficiency, and adapt to high-frequency power application scenarios such as semiconductor manufacturing, communication equipment, and plasma processes. It is a key component in reducing energy reflection in RF systems.
Core product features
Capable of high-precision impedance adjustment, with a standing wave ratio (SWR) of ≤ 1.5, effectively reducing energy reflection loss and ensuring stable operation of the RF system; Support broadband adaptation, compatible with mainstream RF power output frequencies, and meet the power transmission needs of different processes; Integrated real-time impedance monitoring and automatic matching function, fast response speed, can dynamically adapt to changes in load impedance; Industrial grade protection design, strong electromagnetic interference resistance, suitable for complex industrial environments such as high and low temperatures, and high dust, with a stable and durable structure.
Quick overview of key features
Specification parameters: Suitable for RF power transmission scenarios, high impedance matching accuracy, compatible with standard 50 Ω system impedance; Compact modular structure, suitable for integrated installation of standard cabinets or equipment
Interface configuration: including RF input/output interface, control signal interface, and status diagnosis port, supporting linkage control with RF power supply
Reliability: Through strict functional testing, it has overcurrent and overvoltage protection mechanisms, easy maintenance, high operational stability, and meets the long-term service requirements of industrial equipment
Application scenarios
Typical scenarios: semiconductor wafer etching/sputtering process, communication base station RF system, plasma processing equipment, radar transmission and reception system
Core value: Improve the efficiency of RF energy transmission, reduce equipment heating and downtime due to faults, ensure process stability (such as plasma ignition success rate and sputtering rate uniformity), and assist in the efficient operation of industrial production and communication systems
853-064887-061射频匹配器 产品展示
产品视频
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
