1.产 品 资 料 介 绍：
- 规格参数：工作频率 13.56MHz，最大输出功率 2.5KW，兼容 50Ω 标准系统阻抗；紧凑模块化结构，适配半导体设备集成安装
- 接口配置：含专用射频输入 / 输出接口、设备控制信号接口及状态诊断端口，支持与 AMAT 射频电源联动控制
- 可靠性：经原厂功能检测，具备过流、过压、过热三重保护机制，维护便捷，符合半导体行业长期服役标准
- 典型场景：半导体晶圆蚀刻工艺、薄膜溅射沉积设备、等离子体表面处理系统、AMAT 专用半导体制造设备配套
- 核心价值：提升射频能量传输效率，保障等离子体点火成功率与工艺均匀性，减少设备故障停机时间，助力半导体制造流程的高精度、高稳定性运行
0190-42550射频匹配网络器 英文资料：
AMAT (Applied Materials) original 0190-42550 RF matching network device, the core function is to achieve precise impedance matching between 13.56MHz RF power supply and plasma load, convert load impedance into standard 50 Ω output impedance, maximize high-frequency energy transmission efficiency, designed specifically for semiconductor manufacturing plasma processes, and is a key core component to ensure stable energy transmission in etching and sputtering equipment.
Core product features
Targeted adaptation to a fixed frequency band of 13.56MHz, supporting up to 2.5KW power transmission, precise standing wave ratio control, effectively reducing energy reflection loss, and ensuring process stability; Integrated fully automatic impedance matching function, fast response speed, dynamic tracking of load impedance changes and real-time adjustment, without the need for manual intervention; Adopting CV/MAT specific design standards, it is seamlessly compatible with plasma equipment and does not require additional adaptation or modification; Industrial grade reinforced structure with strong electromagnetic interference resistance, suitable for complex working conditions in semiconductor clean workshops, and high long-term operational stability.
Quick overview of key features
Specification parameters: Operating frequency of 13.56MHz, maximum output power of 2.5KW, compatible with 50 Ω standard system impedance; Compact modular structure, suitable for integrated installation of semiconductor equipment
Interface configuration: including dedicated RF input/output interface, device control signal interface, and status diagnosis port, supporting linkage control with AMAT RF power supply
Reliability: Through original factory functional testing, it has triple protection mechanisms for overcurrent, overvoltage, and overheating, easy maintenance, and meets the long-term service standards of the semiconductor industry
Application scenarios
Typical scenarios: semiconductor wafer etching process, thin film sputtering deposition equipment, plasma surface treatment system, AMAT dedicated semiconductor manufacturing equipment supporting
Core value: Improve the efficiency of RF energy transmission, ensure the success rate and process uniformity of plasma ignition, reduce equipment failure downtime, and assist in the high-precision and high stability operation of semiconductor manufacturing processes
0190-42550射频匹配网络器 产品展示
产品视频
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Foxboro P0916AE电子控制器模块
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
