1.产 品 资 料 介 绍:
AMAT 30712650200 射频控制器
开头
AMAT 30712650200 射频控制器是应用材料半导体刻蚀、薄膜沉积设备专用射频管控单元,精准调控射频功率与阻抗匹配,稳定生成腔体等离子体,保障晶圆工艺一致性。
高精度功率闭环调节,输出功率波动极小,工艺重复性强
内置自动阻抗匹配算法,快速适配腔体负载变化
多路射频信号独立管控,多腔体同步作业互不干扰
搭载高速信号采集电路,实时采集电压、电流、驻波数据
多层 EMI 屏蔽结构,隔绝机台射频、电机电磁干扰
集成过温、过流、过压、驻波过高多重安全互锁保护
原厂专用通讯总线,无缝对接设备主控系统传输工艺参数
工业级宽温元器件,适配无尘车间恒温工况长期运行
板载故障记录存储,留存射频异常日志便于工艺追溯
模块化集成结构,分体拆装,检修更换无需整机停机
优化散热风道,满功率长时间运行温升可控不超限
镀金射频端子接口,降低高频信号传输损耗
支持预设多套工艺配方,一键切换不同制程射频参数
上电完整硬件自检,提前排查线路短路、射频源故障
洁净室防腐防尘壳体,耐受微量工艺腐蚀气体环境
结尾
AMAT 30712650200 射频控制器调节精准、防护完善,是半导体等离子体工艺设备核心射频控制组件。
AMAT 30712650200 射频控制器 产品英文
AMAT 30712650200 RF Controller
beginning
The AMAT 30712650200 RF controller is a specialized RF control unit for semiconductor etching and thin film deposition equipment, which accurately regulates RF power and impedance matching, stably generates cavity plasma, and ensures wafer process consistency.
High precision power closed-loop regulation, minimal output power fluctuations, and strong process repeatability
Built in automatic impedance matching algorithm, quickly adapts to changes in cavity load
Multiple RF signals are independently controlled, and multiple cavities operate synchronously without interfering with each other
Equipped with high-speed signal acquisition circuit, real-time acquisition of voltage, current, and standing wave data
Multi layer EMI shielding structure, isolating machine RF and motor electromagnetic interference
Integrated multiple safety interlock protections for overheating, overcurrent, overvoltage, and high standing wave
Factory specific communication bus seamlessly connects with the main control system of the equipment to transmit process parameters
Industrial grade wide temperature element device, suitable for long-term operation under constant temperature conditions in dust-free workshops
Storage of onboard fault records, retention of RF anomaly logs for easy process traceability
Modular integrated structure, separate disassembly and assembly, maintenance and replacement without the need for complete machine shutdown
Optimize the heat dissipation duct to ensure that the temperature rise during long-term operation at full power is controllable and does not exceed the limit
Gold plated RF terminal interface reduces high-frequency signal transmission loss
Support preset multiple process formulas, one click switch between different process RF parameters
Power on complete hardware self-test, pre check for line short circuits and RF source faults
Clean room anti-corrosion and dustproof shell, resistant to trace process corrosive gas environment
ending
The AMAT 30712650200 RF controller has precise adjustment and complete protection, and is the core RF control component of semiconductor plasma process equipment.
AMAT 30712650200 射频控制器 产品展示

视频展示
中文产品
PCD231B 3HHE025541R0101通信输入/输出模块
PM511V16 3BSE011181R1处理器模块
SIEGER 05701-A-0329继电器卡
CONTACT RATING AG1-SDT1-24U-DEN-A55 Ground Fault Sensor
SIEMENS 6ES7331-1KF02-0AB0 Programming Module
ACS880-07-0725A-3 frequency converter
| PMB33E-10114-00 | ICSI08E3 | 3BSE001552R1 SC610 |
| PMB33E-10101-03 | 70 PR 03c-E | 57160001-ADK DSTX 170 |
| PMB33E-10101-02 | IMDSI02 | PMB33F-20200-03 |
| PMB33E-10101-01 | IIMSM01 | LR370A-E |
| PMB33E-10101-00 | AMAT 0100-00408 | PFRL101B 0.5KN |
The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218




