Advanced Energy 3156113-024射频发生器
1.产 品 资 料 介 绍：
Advanced Energy 3156113-024 射频发生器
- 原厂适配多款半导体工艺腔体，替换安装无需大幅改动线路
- 高精度闭环功率调控，输出功率波动小，等离子体状态均匀
- 实时监测正向、反射功率，出现电弧快速抑制，保护腔体部件
- 内置过温、过流、驻波比超限多重安全保护，异常自动停机
- 内置高效散热风道，长时间满载运行温升可控，不易过热
- 支持工业总线通讯，可对接设备主控远程设定、调取功率参数
- 机身搭载状态显示屏与故障代码提示，故障检修定位高效
- 断电自动留存常用工艺功率参数，重启无需重复配置
- 内部电路信号隔离，隔绝真空、电机带来的电磁干扰
- 模块化分体结构，易拆解维护，损坏部件可单独更换
- 输出波形干净低杂波，减少工艺缺陷，提升晶圆生产良率
- 标准机柜安装尺寸，兼容主流镀膜、刻蚀设备机柜布局
- 整机防静电防护设计，适配无尘洁净车间生产环境
- 耐受长时间 24 小时连续量产运行，元器件使用寿命持久
- 出厂完成功率、驻波全量程校准，上机即可投入工艺生产Advanced Energy 3156113-024 射频发生器是半导体等离子制程核心供电设备，保障刻蚀、沉积工艺参数稳定可控。
Advanced Energy 3156113-024射频发生器 产品英文
Advanced Energy 3156113-024 RF Generator
Advanced Energy 3156113-024 is a specialized RF generator for semiconductor etching and thin film deposition processes, which stably outputs RF energy to excite plasma.
Original factory compatible with multiple semiconductor process chambers, replacement installation does not require significant changes to the circuit
High precision closed-loop power regulation, small output power fluctuations, and uniform plasma state
Real time monitoring of forward and reflected power, rapid suppression of arc occurrence, and protection of cavity components
Built in multiple safety protections for overheating, overcurrent, and standing wave ratio exceeding limits, with automatic shutdown in case of abnormal conditions
Built in high-efficiency heat dissipation duct, controllable temperature rise during long-term full load operation, and less prone to overheating
Supports industrial bus communication, can be remotely set and retrieve power parameters through device master control
The body is equipped with a status display screen and fault code prompts, making fault diagnosis and location efficient
Power off automatically retains commonly used process power parameters, and restarts without the need for repeated configuration
Internal circuit signal isolation, isolating electromagnetic interference caused by vacuum and motor
Modular split structure, easy to disassemble and maintain, damaged parts can be replaced separately
Output waveform clean and low noise, reduce process defects, and improve wafer production yield
Standard cabinet installation dimensions, compatible with mainstream coating and etching equipment cabinet layouts
Whole machine anti-static protection design, suitable for dust-free clean workshop production environment
Endure continuous production operation for 24 hours for a long time, with long-lasting service life of components
After completing the full range calibration of power and standing wave at the factory, it can be put into process production on the machine
The Advanced Energy 3156113-024 RF generator is the core power supply equipment for semiconductor plasma processes, ensuring stable and controllable etching and deposition process parameters.
Advanced Energy 3156113-024射频发生器 产品展示
视频展示
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
