Daihen RMN-20K3-V射频自动匹配器

Daihen RMN-20K3-V射频自动匹配器  

1.产 品 资 料 介 绍：

Daihen RMN-20K3-V 射频自动匹配器

Daihen RMN-20K3-V 适配半导体刻蚀、薄膜等离子腔体

20kW 大功率 13.56MHz 阻抗自动匹配，适配重负载工况

匹配调节速度快，等离子起弧稳定无功率反射

内置高精度功率采样，实时监控入射、反射功率

水冷散热结构，长时间满功率运行温升可控

内置过功率、过温、驻波比超标多重保护

标准通讯接口，可联动射频电源与设备主控

内部精密可调电容电感模组，匹配范围广

腔体阻抗波动时自动快速追踪调整参数

外壳洁净防尘设计，满足无尘车间使用标准

故障代码自检，快速定位匹配电路异常

整机屏蔽结构，抑制射频干扰周边板卡

同系列 RMN 模组通用接口，替换拆装简单

出厂工艺校准，上机无需复杂参数调试

一体化紧凑机身，节省设备机柜安装空间

综上，Daihen RMN-20K3-V 射频自动匹配器匹配高效、防护完善，是大功率等离子工艺设备核心射频配套部件

Daihen RMN-20K3-V射频自动匹配器   产品英文

Daihen RMN-20K3-V RF Automatic Matcher

Daihen RMN-20K3-V is compatible with semiconductor etching and thin film plasma chambers

20kW high-power 13.56MHz impedance automatic matching, suitable for load balancing conditions

Fast matching adjustment speed, stable plasma arc initiation without power reflection

Built in high-precision power sampling, real-time monitoring of incident and reflected power

Water cooled cooling structure, controllable temperature rise during long-term full power operation

Built in multiple protections for over power, over temperature, and standing wave ratio exceeding the standard

Standard communication interface, capable of linking RF power supply and equipment master control

Internal precision adjustable capacitor and inductor module, with a wide matching range

Automatically and quickly track and adjust parameters when the impedance of the cavity fluctuates

The shell is designed to be clean and dust-proof, meeting the standards for use in dust-free workshops

Fault code self check, quickly locate matching circuit abnormalities

Whole machine shielding structure, suppressing RF interference from peripheral boards

Universal interface for RMN modules in the same series, easy to ｒｅｐｌａｃｅ and disassemble

Factory process calibration, no need for complex parameter debugging on the machine

Integrated compact body, saving equipment cabinet installation space

In summary, the Daihen RMN-20K3-V RF automatic matching device has high matching efficiency and complete protection, and is the core RF matching component of high-power plasma process equipment

Daihen RMN-20K3-V射频自动匹配器  产品展示

视频展示

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218