1.产 品 资 料 介 绍：
TEL 2L81-050097-V3 射频控制器 产品英文
TEL 2L81-050097-V3 is a dedicated RF controller for semiconductor etching equipment, with precise power regulation and stable control of plasma RF output in the cavity.
1. High precision RF power regulation with minimal output fluctuations
2. Real time impedance monitoring to reduce RF reflection loss
3. Built in electromagnetic isolation to resist complex machine interference
4. Wide temperature operation, suitable for high and low temperature conditions in clean rooms
5. Gold plated RF interface, stable long-term connection without jumping
6. Fast signal response, plasma start stop without delay
7. Equipped with fault self check and automatic alarm protection for over reflection
8. Reinforce the seismic resistance of the plate body and adapt to continuous vibration of the production line
9. Multi layer shielding structure reduces RF signal leakage
10. Standard rack plug-in, easy to disassemble and maintain
11. Multiple overcurrent, overpressure, and overheat protection, not easily burned out
12. Multi process parameter storage, one click process switching
13. Low loss circuit design, lower overall temperature rise
14. Match all TEL etching and thin film equipment electrical controls across the range
15. Original factory aging test, supporting 7 × 24-hour continuous operation
Conclusion: TEL 2L81-050097-V3 RF control is stable and reliable, and is a core control component for semiconductor plasma processes.
TEL 2L81-050097-V3 射频控制器 产品展示
视频展示
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| 169-100P-120 | PA08T-133 | 750-400159-00 |
| 1667607-00 B | PA08S-133 | 073-655650-00 |
| 1667607-00 | PA06S-133 | 705-659750-00 |
| 15664-000 | PA05S-133 | 710-212470-000 |
| 14-017697 | RED LION CR10001000000210 | 750-693047-002 |
The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
