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SHIMADZU TMP-3403LMC-T4 涡轮分子泵

发布时间:2026-08-27人气:
  • SHIMADZU TMP-3403LMC-T4 涡轮分子泵
  • SHIMADZU TMP-3403LMC-T4 涡轮分子泵
  • SHIMADZU TMP-3403LMC-T4 涡轮分子泵

SHIMADZU TMP-3403LMC-T4 涡轮分子泵 

1.产 品 资 料 介 绍:

SHIMADZU TMP‑3403LMC‑T4 涡轮分子泵是磁悬浮大抽速分子泵,面向半导体超高真空腔体抽气,核心产品特点如下:
1. 磁悬浮轴承,无机械接触磨损
2. 全干式无油,输出洁净真空环境
3. 转子防腐镀层,耐受部分腐蚀性工艺气体
4. 大抽速设计,快速建立超高真空
5. 内置拖拽级,提升前级耐受压力
6. 振动幅值低,适配精密工艺腔体
7. 实时采集转速、温度运行参数
8. 过温、过载、超压多重故障保护
9. 支持设备总线通讯,对接机台主控
10. 轻气体压缩比高,氢气氦气抽排优异
11. 支持转速可调,适配不同工艺负载
12. 氮气吹扫接口,抑制工艺粉尘堆积
13. 模块化结构,现场拆装维护便捷
14. 标准法兰接口,管路替换安装简单
15. 可匹配多款前级泵,适配多样真空系统
SHIMADZU TMP‑3403LMC‑T4 涡轮分子泵性能强劲,多用于半导体刻蚀、薄膜沉积等高流量超高真空工艺。

SHIMADZU TMP-3403LMC-T4 涡轮分子泵  产品英文介绍

The SHIMADZU TMP 3403LMC T4 turbo molecular pump is a magnetic levitation high pumping speed molecular pump designed for semiconductor ultra-high vacuum chamber pumping. Its core product features are as follows:

1. Magnetic levitation bearings, without mechanical contact wear

2. Fully dry and oil-free, outputting a clean vacuum environment

3. Anti corrosion coating on the rotor, resistant to some corrosive process gases

4. High pumping speed design, quickly establishing ultra-high vacuum

5. Built in drag and drop level to enhance the pressure tolerance of the front stage

6. Low vibration amplitude, suitable for precision process chambers

7. Real time collection of operating parameters such as speed and temperature

8. Multiple fault protection against overheating, overload, and overpressure

9. Support device bus communication and interface with the machine master control

10. High compression ratio of light gas, excellent hydrogen and helium pumping performance

11. Supports adjustable speed and adapts to different process loads

12. Nitrogen purging interface to suppress the accumulation of process dust

13. Modular structure, convenient on-site disassembly and maintenance

14. Standard flange interface, easy replacement and installation of pipelines

15. Can match multiple front-end pumps and adapt to various vacuum systems

SHIMADZU TMP 3403LMC T4 turbo molecular pump has strong performance and is commonly used in high flow and ultra-high vacuum processes such as semiconductor etching and thin film deposition.

SHIMADZU TMP-3403LMC-T4 涡轮分子泵  产品展示

TMP-3403LMC-T4.webp (1).jpg

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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