MKS FI20620-1 远程等离子源

MKS FI20620-1 远程等离子源 

1.产 品 资 料 介 绍：

MKS FI20620-1 远程等离子源 产品英文介绍

MKS FI20620-1 belongs to Astron2L remote plasma source, which generates active free radicals for semiconductor cavity cleaning and process processing.

Application areas

1. Dry cleaning of semiconductor CVD process chamber

2. Removal of sediment from etching equipment chamber

3. Plasma ashing and stripping of photoresist

4. Compound semiconductor wafer processing technology

5. Maintenance and cleaning of the chamber of the thin film deposition equipment

6. Surface modification treatment of low-k dielectric materials

7. Advanced chip packaging cavity purification

8. Cleaning of photovoltaic thin film deposition equipment chamber

9. Plasma dissociation treatment of process exhaust gas

10. Free radical supply for nitrogen oxidation process

Product Parameters

1. RF excitation, power 3000W, gas dissociation efficiency higher than 95%

2. Compatible with multiple process gases including NF3, O2, N2, and H2

3. Water cooling and heat dissipation, supporting long-term continuous production operation

4. Equipped with EtherCAT and analog I/O industrial communication interface

5. Quartz cavity structure with minimal particle generation, suitable for clean processes

Overall, the MKS FI20620-1 remote plasma source has stable performance and high dissociation efficiency, making it a key component for cavity cleaning of semiconductor thin film equipment.

MKS FI20620-1 远程等离子源  产品展示

视频展示

其他产品

 CI854A 3BSE030221R1 可编程逻辑控制器
 CI855K013BSE018106R1 通讯设备模块
 CI867 3BSE043661R1通信接口模块

英文产品

8521-LC-MT Bus structure module
BENTLY 9200-01-01-10-00 Sensor module
AI3281 AI3281-A-V001 pulse output card

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218