邮箱:stodcdcs@gmail.com

手机/微信/WhatsApp

+86 15270269218

stodcdcs@gmail.com

GENESIS 27-406204-00 射频发生器

发布时间:2026-08-31人气:
  • GENESIS 27-406204-00 射频发生器
  • GENESIS 27-406204-00 射频发生器
  • GENESIS 27-406204-00 射频发生器

GENESIS 27-406204-00 射频发生器 

1.产 品 资 料 介 绍:

GENESIS 27‑406204‑00 射频发生器,半导体等离子工艺专用射频电源。
产品特点:
1. 全固态功率架构,输出功率闭环快速稳定
2. 可承受较高驻波比,负载突变不易停机
3. 支持本地面板与远程上位机双重控制
4. 谐波抑制能力强,降低工艺干扰
5. 具备电弧检测功能,快速抑制等离子打火
6. 内置多重保护,故障可输出报警信号
7. 支持模拟、数字接口,适配半导体设备 PLC
8.19 英寸标准机架式,机柜安装拆装便捷
9. 水冷散热设计,长时间满载运行温升低
10. 正向反向功率实时监测,方便工艺调试
产品参数:
1. 工作频率:27.12MHz
2. 输出功率:最大 4000W,0‑4000W 可调
3. 通讯接口:模拟 I/O、RS232 通讯
4. 保护功能:过温、过流、过驻波、电弧、互锁保护
5. 冷却方式:水冷冷却
GENESIS 27‑406204‑00 多用于刻蚀、薄膜沉积等半导体等离子工艺工位

GENESIS 27-406204-00 射频发生器 产品英文介绍

GENESIS 27-406204-00 RF generator, a specialized RF power supply for semiconductor plasma processes.

Product Features:

1. All solid state power architecture, fast and stable output power closed-loop

2. Can withstand high standing wave ratio, and is not easily shut down due to sudden load changes

3. Support dual control of local panel and remote upper computer

4. Strong harmonic suppression ability, reducing process interference

5. Equipped with arc detection function, quickly suppress plasma ignition

6. Built in multiple protections, capable of outputting alarm signals in case of faults

7. Supports analog and digital interfaces, compatible with semiconductor equipment PLC

8.19-inch standard rack mounted, easy to install and disassemble cabinet

9. Water cooling and heat dissipation design, low temperature rise during long-term full load operation

10. Real time monitoring of forward and reverse power for convenient process debugging

Product Parameters:

1. Operating frequency: 27.12MHz

2. Output power: maximum 4000W, adjustable from 0 to 4000W

3. Communication interface: Analog I/O, RS232 communication

4. Protection functions: over temperature, over current, over standing wave, arc, interlock protection

5. Cooling method: water-cooled cooling

GENESIS 27-406204-00 is widely used in semiconductor plasma process stations such as etching and thin film deposition

GENESIS 27-406204-00 射频发生器 产品展示

27-406204-00.webp.jpg

视频展示


其他产品

TEWS TPMC815-50 控制模块
YOKOGAWA YNT511D 驱动器模块
A-B 1336F-MCB-SP2G 交流驱动器

英文产品

5X00594G01 analog output module
IC698CHS017B Combustion engine framework
A6110 Shaft vibration measurement module

F46HSNA-R2-NS-NV-02531X133PR0APG1F31X300CCHAKG2
F46HENA-R2-NS-NV-00531X132APGACG1F31X300CCHAFG1
F46HEAA-R2-NS-NV-00531X132APGAAG1F31X300CCHADG1
F46HCNA-R2-NS-NV-00531X129SNCG1F31X300CCHAAG1
F46GENA-R2-NS-NV-00531X129SNCADG1F31X210DMCACG1
F46GEBA-R4-NS-NV-00531X128HMSAGG1F31X199SPTACG1
F46GEAA-R2-NS-NV-00531X128HMSADG2F31X191RTBAG3

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

推荐资讯

+86 15270269218