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AMAT 0190-05624 射频发生器

发布时间:2026-08-31人气:
  • AMAT 0190-05624 射频发生器
  • AMAT 0190-05624 射频发生器
  • AMAT 0190-05624 射频发生器

AMAT 0190-05624 射频发生器 

1.产 品 资 料 介 绍:

AMAT 0190‑05624 射频发生器,适配 Endura2 半导体设备等离子体射频电源。
产品特点:
1. 全固态射频功率输出,功率闭环控制输出稳定
2. 可承受较高反射功率,等离子点火负载突变不易停机
3. 内置电弧检测电路,快速识别并抑制腔体打火
4. 谐波抑制优秀,降低杂波对工艺结果的干扰
5. 支持脉冲功率模式,满足特殊等离子工艺需求
6. 实时采集正向、反射功率,工艺数据可监控上传
7. 完备故障诊断,过温、过驻波等故障输出报警信号
8. 兼容 AMAT 设备背板通讯,对接整机控制系统
9. 机架式模块化结构,拆装更换维护便捷
10. 支持 7×24 小时连续运行,适配晶圆产线生产
产品参数:
1. 工作频率:13.56MHz
2. 输出功率:功率连续可调,适配腔体等离子工艺
3. 通讯接口:设备专用背板数字通讯接口
4. 保护功能:过温、过驻波、电弧、过流互锁保护
5. 适配设备:AMAT Endura2 工艺平台
AMAT 0190‑05624 主要用于薄膜沉积、金属刻蚀等离子工艺工位

AMAT 0190-05624 射频发生器 产品英文介绍

AMAT 0190-05624 RF generator, compatible with Endura2 semiconductor equipment plasma RF power supply.

Product Features:

1. All solid state RF power output, power closed-loop control for stable output

2. It can withstand high reflection power and is not easy to shut down due to sudden changes in plasma ignition load

3. Built in arc detection circuit, quickly identify and suppress chamber ignition

4. Excellent harmonic suppression, reducing the interference of clutter on the process results

5. Support pulse power mode to meet special plasma process requirements

6. Real time collection of forward and reflected power, process data can be monitored and uploaded

7. Complete fault diagnosis, output alarm signals for faults such as over temperature and over standing wave

8. Compatible with AMAT device backplane communication and integrated with the overall control system

9. Rack mounted modular structure, easy disassembly, replacement, and maintenance

10. Supports 7 × 24-hour continuous operation and is compatible with wafer production lines

Product Parameters:

1. Operating frequency: 13.56MHz

2. Output power: The power is continuously adjustable and suitable for cavity plasma technology

3. Communication interface: Device specific backplane digital communication interface

4. Protection function: Over temperature, over standing wave, arc, overcurrent interlock protection

5. Compatible equipment: AMAT Endura2 process platform

AMAT 0190-05624 is mainly used in plasma process stations for thin film deposition and metal etching

AMAT 0190-05624 射频发生器 产品展示

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视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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