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AE 3150017-026射频发生器

发布时间:2026-09-10人气:
  • AE 3150017-026射频发生器
  • AE 3150017-026射频发生器
  • AE 3150017-026射频发生器

AE 3150017-026射频发生器  

1.产 品 资 料 介 绍:

AE 3150017-026 射频发生器,属于 RF30S 系列固态射频电源,为半导体等离子工艺提供稳定射频能量。
产品特点:
1. 功率闭环调控,等离子状态波动小,批次工艺一致性好
2. 内置电弧抑制功能,快速灭弧,减少晶圆表面损伤
3. 小型机架式机身,机柜内部安装布局灵活
4. 支持远程信号读写,方便机台集成监控
5. 内置多重保护机制,负载异常自动切断射频输出
产品参数:
6. 型号:3150017-026
7. 射频类型:RF30S 固态射频发生器
8. 额定输出功率:3000W
9. 工作频率:13.56MHz
10. 散热方式:风冷散热
应用领域:
11. 半导体 PVD 溅射镀膜等离子供电
12. CVD 薄膜沉积设备射频源
13. 晶圆等离子刻蚀工艺
14. 平板显示镀膜工艺
15. 半导体产线射频电源备件替换
等离子镀膜设备故障更换,AE 3150017-026 射频发生器适配原有设备回路

AE 3150017-026射频发生器  产品英文介绍

AE 3150017-026 RF generator belongs to the RF30S series solid-state RF power supply, providing stable RF energy for semiconductor plasma processes.

Product Features:


1. Power closed-loop regulation, minimal plasma state fluctuations, and good batch process consistency

2. Built in arc suppression function, quickly extinguishing arcs and reducing wafer surface damage

3. Small rack mounted body, flexible installation layout inside the cabinet

4. Support remote signal reading and writing, convenient for machine integration monitoring

5. Built in multiple protection mechanisms, automatically cutting off RF output in case of abnormal load

Product Parameters:

6. Model: 3150017-026

7. RF type: RF30S solid-state RF generator

8. Rated output power: 3000W

9. Operating frequency: 13.56MHz

10. Heat dissipation method: air-cooled heat dissipation

Application fields:

11. Plasma power supply for semiconductor PVD sputtering coating

12. RF source for CVD thin film deposition equipment

13. Wafer plasma etching process

14. Flat panel display coating process

15. Replacement of spare parts for RF power supply in semiconductor production lines

Plasma coating equipment malfunction replacement, AE 3150017-026 RF generator adapted to the original equipment circuit

AE 3150017-026射频发生器  产品展示

3150017-026.webp.jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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