CV-2000 FP3344R1射频发生器

CV-2000 FP3344R1射频发生器 

1.产 品 资 料 介 绍：

CV-2000 FP3344R1射频发生器  产品英文介绍

The CV-2000 FP3344R1 RF generator is a commonly used RF power source for semiconductor vacuum equipment, and there is a large circulation of spare parts on the production line

1. Excellent power output stability, with minimal fluctuations during long-term continuous operation, ensuring consistency in plasma processes

2. Built in arc detection protection, power reduction at the moment of ignition, reducing the probability of damage to components inside the cavity

3. Suitable for 50 Ω standard impedance, can work together with a matching device to cope with changes in cavity load

4. Comes with two control methods: local panel and remote communication, making it convenient for machine integration and debugging

5. Air cooled cooling structure, sufficient internal maintenance space, easy disassembly and maintenance

1. Model CV-2000 FP3344R1

2. Rated output power 2000W

3. Operating frequency 13.56MHz

4. Standard output impedance of 50 Ω

5. Support continuous and pulse power output modes

This RF generator is commonly used in various plasma vacuum process equipment

1. Power supply for semiconductor wafer etching equipment

2. Thin film deposition PVD and CVD processes

3. Plasma cleaning treatment on wafer surface

4. Optical coating plasma processing equipment

5. Replacement and maintenance of spare parts for old plasma equipment

Overall, CV-2000 FP3344R1 is a mature 2kW RF power supply and a popular spare part for repairing and replacing second-hand semiconductor equipment

CV-2000 FP3344R1射频发生器   产品展示

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英文产品

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218