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ADTEC 27-307431-00等离子体发生器模块

发布时间:2026-09-16人气:
  • ADTEC 27-307431-00等离子体发生器模块
  • ADTEC 27-307431-00等离子体发生器模块
  • ADTEC 27-307431-00等离子体发生器模块

ADTEC 27-307431-00等离子体发生器模块 

1.产 品 资 料 介 绍:

ADTEC 27-307431-00 等离子体发生器模块是半导体机台配套射频电源,工艺稳定性很好。
产品特点
功率输出平稳,保证等离子体状态一致。
带电弧快速抑制,减少腔体打火损伤。
抗反射负载能力强,适配工艺波动。
机架安装,备件替换简单快捷。
自带状态监测,方便故障快速排查。
产品参数
型号 27-307431-00 射频发生器。
适配半导体薄膜工艺机台。
高频射频功率输出。
内置功率与反射信号采集。
原厂标准通讯接口对接机台。
应用领域
半导体薄膜沉积工艺供电。
晶圆刻蚀腔体等离子体激发。
旧款半导体设备电源备件更换。
真空等离子表面处理设备。
精密镀膜机射频供电单元。
这款等离子体发生器是日系半导体设备常用备件,维修替换需求比较多。

ADTEC 27-307431-00等离子体发生器模块  产品英文介绍

ADTEC 27-307431-00 plasma generator module is a semiconductor machine matching RF power supply with good process stability.

Product Features

Stable power output ensures consistent plasma state.

Rapid suppression of electric arc, reducing damage caused by chamber ignition.

Strong anti reflective load capacity and adaptability to process fluctuations.

Rack installation, easy and quick replacement of spare parts.

Equipped with status monitoring, convenient for quick troubleshooting.

Product Specifications

Model 27-307431-00 RF generator.

Suitable for semiconductor thin film processing machines.

High frequency RF power output.

Built in power and reflection signal acquisition.

Original factory standard communication interface docking machine.

Application Areas

Power supply for semiconductor thin film deposition process.

Plasma excitation in wafer etching chamber.

Replacement of power spare parts for old semiconductor equipment.

Vacuum plasma surface treatment equipment.

RF power supply unit for precision coating machine.

This plasma generator is a commonly used spare part for Japanese semiconductor equipment, with a high demand for maintenance and replacement.

ADTEC 27-307431-00等离子体发生器模块  产品展示

27-307431-00.webp.jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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