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AMAT 0190-54072射频发生器

发布时间:2026-09-17人气:
  • AMAT  0190-54072射频发生器
  • AMAT  0190-54072射频发生器
  • AMAT  0190-54072射频发生器

AMAT  0190-54072射频发生器 

1.产 品 资 料 介 绍:

AMAT 0190-54072 射频发生器
产品特点
1 功率输出精准 等离子工艺重复性稳定
2 自带电弧防护 减少腔体打火损伤器件
3 阻抗匹配快 起辉稳定适配真空腔体
4 数字调控 方便接入设备远程监控
5 机身紧凑 适合半导体机柜内部安装
产品参数
1 工业交流供电 适配半导体设备机柜
2 固定射频频率 满足等离子工艺需求
3 内置故障自检 异常输出报警信号
4 支持设备总线通讯 实时上传数据
5 水冷散热 长时间运行控温稳定
应用领域
1 半导体晶圆刻蚀等离子供电
2 薄膜沉积设备射频电源单元
3 真空腔体等离子清洗配套
4 PVD 镀膜工艺等离子激发
5 半导体设备备件替换配套
这款 AMAT 0190-54072 射频发生器是应用材料原厂备件,多用于半导体旧设备电源更换

AMAT  0190-54072射频发生器   产品英文介绍

AMAT 0190-54072 RF Generator

Product Features

1. Accurate power output, stable repeatability of plasma process

2. Equipped with arc protection to reduce damage caused by ignition in the cavity

3 impedance matching, fast start, stable and adaptable to vacuum chambers

4 digital controls for convenient access to remote monitoring of devices

5 compact body suitable for internal installation in semiconductor cabinets

Product Specifications

Industrial AC power supply compatible with semiconductor equipment cabinet

2 fixed RF frequencies to meet plasma process requirements

3 built-in fault self-test abnormal output alarm signal

4. Support real-time data upload through device bus communication

5. Water cooling for long-term operation and stable temperature control

Application Areas

1. Plasma power supply for semiconductor wafer etching

RF power supply unit for thin film deposition equipment

3 Vacuum chamber plasma cleaning matching

4 PVD coating process plasma excitation

5. Replacement and matching of semiconductor equipment spare parts

This AMAT 0190-54072 RF generator is a spare part from the application material factory, commonly used for replacing power supplies in old semiconductor equipment

AMAT  0190-54072射频发生器   产品展示

0190-54072.webp (1).jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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