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AE 3Z80-000653-V2射频匹配器

发布时间:2026-09-17人气:
  • AE 3Z80-000653-V2射频匹配器
  • AE 3Z80-000653-V2射频匹配器
  • AE 3Z80-000653-V2射频匹配器

AE 3Z80-000653-V2射频匹配器 

1.产 品 资 料 介 绍:

AE 3Z80-000653-V2 射频匹配器
产品特点
1 自动调谐速度快,快速降低射频反射功率
2 功率传输损耗低,等离子起辉稳定
3 内置电弧保护,打火时保护射频电源
4 屏蔽效果好,抵御机柜电磁干扰
5 模块化结构,拆装替换简单
产品参数
1 配套同系列射频电源供电
2 自动阻抗调谐,适配真空负载
3 水冷散热,大功率长时间运行稳定
4 内置传感器实时反馈匹配状态
5 原厂接口,直接对接射频线路
应用领域
1 半导体刻蚀设备射频阻抗匹配
2 PECVD 薄膜沉积射频配套单元
3 真空等离子清洗设备功率调配
4 光学镀膜等离子工艺匹配
5 日本高周波射频设备备件更换
这款 AE 3Z80-000653-V2 射频匹配器用于射频电源阻抗调节,半导体真空机台维修常用备件

AE 3Z80-000653-V2射频匹配器   产品英文介绍

AE 3Z80-000653-V2 RF Matcher

Product Features

1. Fast automatic tuning speed, quickly reducing RF reflection power

Low power transmission loss and stable plasma ignition

3 built-in arc protection, protecting RF power supply during ignition

4. Good shielding effect to resist electromagnetic interference from cabinets

5 modular structure, easy disassembly and replacement

Product Specifications

1. Equipped with RF power supply of the same series

2 automatic impedance tuning, suitable for vacuum loads

3 water cooling and heat dissipation, stable operation for a long time with high power

4 built-in sensors provide real-time feedback on matching status

5 original factory interfaces, directly connected to RF lines

Application Areas

RF impedance matching of semiconductor etching equipment

2 PECVD thin film deposition RF matching unit

3. Power allocation of vacuum plasma cleaning equipment

4 Optical Coating Plasma Process Matching

Replacement of spare parts for high-frequency RF equipment in Japan

This AE 3Z80-000653-V2 RF matching device is used for RF power impedance adjustment and is a commonly used spare part for semiconductor vacuum machine maintenance

AE 3Z80-000653-V2射频匹配器  产品展示

3Z80-000653-V2.webp.jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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