1.产 品 资 料 介 绍：
TEL 3D80-000825-V4射频发生器 产品英文介绍
TEL 3D80-000825-V4 RF generator, equipped with RF power supply for Tokyo Electronic Machine, supplies RF energy to the process chamber and excites plasma.
Product Features
1. The power output is linearly adjustable and suitable for various process formulas
2. Real time monitoring of reflected power, automatic protection in case of abnormalities
3. Solid state circuit design, fast startup and ignition speed
4. Water cooling for heat dissipation, controllable temperature rise during long-term operation
5. Good RF shielding reduces interference to surrounding boards
6. Support remote control from the upper computer, with sensitive command response
7. Strong load adaptability, and the fluctuation of cavity state is not easy to jump power
8. The fault code is intuitive and convenient for quick on-site troubleshooting
9. Standard rack size, easy replacement and installation of cabinets
10. The components have undergone aging screening and have good stability in mass production
Application Areas
1. TEL etching chamber plasma excitation power supply
2. RF power supply unit for thin film deposition process
3. Wafer plasma cleaning equipment
4. Semiconductor debonding process chamber
5. Vacuum plasma processing system
TEL 3D80-000825-V4 RF generator has stable ignition and precise power control, making it the core RF power supply spare part for TEL semiconductor machine plasma process.
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
