1.产 品 资 料 介 绍：
AMAT 0190-51023射频匹配器 产品英文介绍
AMAT 0190-51023 RF Matcher
Product Features
Fast automatic impedance tuning reduces RF reflection power to ensure stable plasma process
Built in arc detection and suppression function reduces chamber ignition and protects wafers and target materials
Support machine communication interaction and remote monitoring of matching status and parameters
The integrated water-cooled heat dissipation structure is suitable for long-term continuous process operation
Original factory standardized structure for easy disassembly and assembly, reducing equipment downtime and maintenance time
Application Areas
AMAT etching cavity RF impedance matching adjustment
RF power matching of PVD physical vapor deposition chamber
Plasma RF Circuit Control in CVD Thin Film Deposition Process
RF impedance adjustment for wafer plasma surface treatment
Replacement and maintenance of spare parts for RF matching devices in semiconductor production lines
Refurbishment and renovation of chip equipment with RF matching unit
Research and development of experimental plasma equipment RF load matching
RF power control of photoresist plasma ashing process
RF source cavity matching for magnetron sputtering coating equipment
RF Energy Transmission Control of ICP Plasma Process Chamber
The model of this RF matching device used for semiconductor plasma cavity RF impedance adjustment is AMAT 0190-51023.
AMAT 0190-51023射频匹配器 产品展示
视频展示
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| PMB33C-00216-00 | AMAT 0100-20164 | K9033-015 K9033-015 ABB |
| PMB33C-00214-03 | PHBRMU10010000 | 57120001-FX DSAI 160 |
| PMB33C-00214-02 | 70 AA 02a-E | PFRL101C 0.5KN 3BSE023316R0502 |
| PMB33C-00214-01 | IIMPM02 | 57120001-PG DSXW 110 |
| PMB33C-00214-00 | IMMFP11 | M22NSHS-LNN-NS-02 |
| PMB33C-00201-03 | NKMP03 | 57120001-LE DSAI 135 |
The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
