TEL Tokyo Electron 1D80-003300-11气门角阀
1.产 品 资 料 介 绍：
中文资料：
TEL Tokyo Electron 1D80-003300-11 气门角阀 是应用于半导体设备中一种用于精确气体控制的关键部件。该组件在真空或气体处理系统中起着“开/关”和流量调节的作用，主要用于工艺气体的分配、隔离与调节。
一、产品名称
部件型号： 1D80-003300-11
产品描述： 气门角阀（可能为带驱动的高洁净气体阀门）
适用设备： Tokyo Electron（TEL）半导体制程设备，如CVD、Etcher、ALD等系统
二、功能与作用
气体流通控制
控制特定工艺气体（如 SiH₄、NH₃、O₂ 等）在半导体工艺腔体中的通断状态。真空隔离功能
用作真空腔体与气体源之间的隔离阀门，具备优异的密封性能。角阀结构设计
流道呈90度结构，适合设备内部紧凑空间布局，降低颗粒堆积风险。自动化驱动支持
多数为气动驱动或电动驱动，可由系统控制信号远程启闭。
三、典型应用领域
CVD（化学气相沉积）系统
控制前驱体气体进入反应腔，确保沉积厚度与均匀性。等离子体蚀刻系统
控制反应性气体的进入或排放，支持反应工艺稳定性。ALD（原子层沉积）设备
实现精确时间控制的气体切换，满足层层堆叠的精度需求。清洗与排气系统
用于导通/关闭N₂、Ar等惰性气体路径，协助设备清洁与气路置换。
英文资料：
TEL Tokyo Electron 1D80-003300-11 valve angle valve is a key component used for precise gas control in semiconductor equipment. This component plays the role of "on/off" and flow regulation in vacuum or gas processing systems, mainly used for the distribution, isolation, and regulation of process gases.
1、 Product Name
Component model: 1D80-003300-11
Product Description: Valve Angle Valve (possibly a high-purity gas valve with drive)
Applicable equipment: Tokyo Electron (TEL) semiconductor process equipment, such as CVD, Etcher, ALD and other systems
2、 Function and Function
Gas circulation control
Control the on/off state of specific process gases (such as SiH ₄, NH3, O ₂, etc.) in the semiconductor process chamber.
Vacuum isolation function
Used as an isolation valve between vacuum chambers and gas sources, it has excellent sealing performance.
Structural design of angle valve
The flow channel has a 90 degree structure, which is suitable for compact space layout inside the equipment and reduces the risk of particle accumulation.
Automated driver support
Most of them are driven by pneumatic or electric means, and can be remotely opened and closed by system control signals.
3、 Typical application areas
CVD (Chemical Vapor Deposition) system
Control the precursor gas entering the reaction chamber to ensure deposition thickness and uniformity.
plasma etching system
Control the entry or emission of reactive gases to support the stability of the reaction process.
ALD (Atomic Layer Deposition) equipment
Realize precise time controlled gas switching to meet the precision requirements of layer by layer stacking.
Cleaning and exhaust system
Used to turn on/off inert gas paths such as N ₂ and Ar, assisting in equipment cleaning and gas path replacement.
2.产 品 展 示
3.其他产品
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
