AMAT Applied Materials 0226-45365热电偶扫描仪
1.产 品 资 料 介 绍:
AMAT Applied Materials 0226-45365 热电偶扫描仪
核心功能
技术特点
典型应用
AMAT Applied Materials 0226-45365热电偶扫描仪 英文资料:
AMAT Applied Materials 0226-45365 Thermocouple Scanner
AMAT 0226-45365 is a high-precision thermocouple scanner designed specifically for semiconductor manufacturing equipment. It is used to simultaneously collect and monitor temperature data from multiple thermocouple sensors, achieving temperature distribution monitoring and process closed-loop control in critical areas of the equipment.
core functionality
Multi channel data acquisition: supports parallel acquisition of multiple thermocouple signals (usually 8-32 channels), synchronously monitoring temperature in different areas
High precision measurement: using low-temperature drift amplification circuit to ensure measurement accuracy over a wide temperature range
Real time data processing: high-speed A/D conversion and digital filtering, providing stable and reliable temperature data
Temperature anomaly alarm: high and low temperature thresholds can be set for each channel, triggering alarms and control signals when exceeded
Data Communication: Supports real-time communication with the main controller and is integrated into the device temperature control system
Technical Features
Measurement accuracy: ± 0.1 ℃ (typical value), full range error ≤ 0.2%
Support types: Compatible with multiple thermocouple types such as K, J, T, E, etc., software configurable
Sampling rate: Single channel up to 100Hz, multi-channel can allocate sampling frequency
Cold end compensation: Built in high-precision cold end compensation circuit to eliminate the influence of environmental temperature
Isolation protection: Electrical isolation between channels (usually above 2.5kV), strong anti-interference ability
Communication interface: Industrial Ethernet or RS-485 (supporting protocols such as Modbus)
Working environment: 0-60 ℃, suitable for installation inside equipment or control cabinets
Typical Applications
Sedimentation equipment: monitoring the temperature distribution of the reaction chamber wall, electrodes, and heating table
Diffusion furnace/annealing furnace: multi-point temperature monitoring during silicon wafer heating process
Etching equipment: Temperature uniformity monitoring of RF cavity and electrode plate
Lithography equipment: temperature stability control of optical system and wafer stage
CMP equipment: temperature distribution monitoring of polishing pads and wafers
AMAT Applied Materials 0226-45365热电偶扫描仪 产品展示
产品视频
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218